Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

  • 2 Similar Profiles
Cleaning Engineering & Materials Science
cleaning Physics & Astronomy
Cavitation Engineering & Materials Science
cavitation flow Physics & Astronomy
wafers Physics & Astronomy
Water Engineering & Materials Science
Sonoluminescence Engineering & Materials Science
Copper Engineering & Materials Science

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Research Output 2006 2018

  • 230 Citations
  • 8 h-Index
  • 39 Article
  • 16 Conference contribution
  • 3 Chapter
  • 1 Review article

Integrated circuit packaging review with an emphasis on 3D packaging

Lancaster, A. & Keswani, M. Jan 1 2018 In : Integration, the VLSI Journal. 60, p. 204-212 9 p.

Research output: Research - peer-reviewReview article

Integrated circuits
Packaging
Mechanical stability
Environmental protection
Temperature control

Acoustic characterization of two megasonic devices for photomask cleaning

Zanelli, C., Giridhar, D., Keswani, M., Okada, N., Hsu, J. & Yam, P. 2016 Photomask Technology 2016. SPIE, Vol. 9985, 998524

Research output: ResearchConference contribution

Application of process simulation for comparison of contactless and conventional electrodeposition methods for 3D packaging

Zhao, M., Jakes, K., Luke, K., Kishore, J., Gouk, R., Verhaverbeke, S., Shadman, F. & Keswani, M. 2016 In : ECS Journal of Solid State Science and Technology. 5, 9, p. P483-P488

Research output: Research - peer-reviewArticle

Electrodeposition
Packaging
Copper
Silicon
Deposition rates

Brush Scrubbing for Post-CMP Cleaning

Sun, T., Han, Z. & Keswani, M. Nov 11 2016 Methods for Surface Cleaning. Elsevier Inc., Vol. 9, p. 109-133 25 p.

Research output: ResearchChapter

Chemical mechanical polishing
Brushes
Cleaning
Polyvinyl alcohols
Kinematics

Characterization of cavitation in a single wafer or photomask cleaning tool

Chen, X., Yam, P., Keswani, M., Okada, N. & Zanelli, C. I. 2016 Ultra Clean Processing of Semiconductor Surfaces XIII. Trans Tech Publications Ltd, Vol. 255, p. 207-212 6 p. (Solid State Phenomena; vol. 255)

Research output: ResearchConference contribution

photomasks
cavitation flow
cleaning
wafers
Photomasks