Research Output 2006 2018

  • 230 Citations
  • 8 h-Index
  • 39 Article
  • 16 Conference contribution
  • 3 Chapter
  • 1 Review article
2018

Integrated circuit packaging review with an emphasis on 3D packaging

Lancaster, A. & Keswani, M. Jan 1 2018 In : Integration, the VLSI Journal. 60, p. 204-212 9 p.

Research output: Research - peer-reviewReview article

Integrated circuits
Packaging
Mechanical stability
Environmental protection
Temperature control
2016

Acoustic characterization of two megasonic devices for photomask cleaning

Zanelli, C., Giridhar, D., Keswani, M., Okada, N., Hsu, J. & Yam, P. 2016 Photomask Technology 2016. SPIE, Vol. 9985, 998524

Research output: ResearchConference contribution

Application of process simulation for comparison of contactless and conventional electrodeposition methods for 3D packaging

Zhao, M., Jakes, K., Luke, K., Kishore, J., Gouk, R., Verhaverbeke, S., Shadman, F. & Keswani, M. 2016 In : ECS Journal of Solid State Science and Technology. 5, 9, p. P483-P488

Research output: Research - peer-reviewArticle

Electrodeposition
Packaging
Copper
Silicon
Deposition rates

Brush Scrubbing for Post-CMP Cleaning

Sun, T., Han, Z. & Keswani, M. Nov 11 2016 Methods for Surface Cleaning. Elsevier Inc., Vol. 9, p. 109-133 25 p.

Research output: ResearchChapter

Chemical mechanical polishing
Brushes
Cleaning
Polyvinyl alcohols
Kinematics

Characterization of cavitation in a single wafer or photomask cleaning tool

Chen, X., Yam, P., Keswani, M., Okada, N. & Zanelli, C. I. 2016 Ultra Clean Processing of Semiconductor Surfaces XIII. Trans Tech Publications Ltd, Vol. 255, p. 207-212 6 p. (Solid State Phenomena; vol. 255)

Research output: ResearchConference contribution

photomasks
cavitation flow
cleaning
wafers
Photomasks
3 Citations

Effect of chemical structure on the sonochemical degradation of perfluoroalkyl and polyfluoroalkyl substances (PFASs)

Fernandez, N. A., Rodriguez-Freire, L., Keswani, M. & Sierra-Alvarez, R. Nov 1 2016 In : Environmental Science: Water Research and Technology. 2, 6, p. 975-983 9 p.

Research output: Research - peer-reviewArticle

degradation
rate
effect
chemical structure
Degradation

Fabrication of Radially Symmetric Graded Porous Silicon using a Novel Cell Design

Zhao, M. & Keswani, M. Apr 22 2016 In : Scientific Reports. 6, 24864

Research output: Research - peer-reviewArticle

Porous silicon
Octoxynol
Pore size
Fabrication
Silicon

Giant frequency down-conversion of the dancing acoustic bubble

Deymier, P. A., Keswani, M., Jenkins, N., Tang, C. & Runge, K. Nov 18 2016 In : Scientific Reports. 6, 37385

Research output: Research - peer-reviewArticle

bubbles
acoustics
oscillations
standing waves
Mathieu function

Sonochemical degradation of perfluorinated chemicals in aqueous film-forming foams

Rodriguez-Freire, L., Abad-Fernández, N., Sierra-Alvarez, R., Hoppe-Jones, C., Peng, H., Giesy, J. P., Snyder, S. & Keswani, M. Nov 5 2016 In : Journal of Hazardous Materials. 317, p. 275-283 9 p.

Research output: Research - peer-reviewArticle

foam
degradation
chemical
Foams
Degradation
1 Citations

Sono-electrochemical recovery of metal ions from their aqueous solutions

Dong, B., Fishgold, A., Lee, P., Runge, K., Deymier, P. & Keswani, M. Nov 15 2016 In : Journal of Hazardous Materials. 318, p. 379-387 9 p.

Research output: Research - peer-reviewArticle

Metal ions
Recovery
aqueous solution
ion
metal
1 Citations

The formation mechanism of gradient porous Si in a contactless electrochemical process

Zhao, M., McCormack, A. & Keswani, M. 2016 In : Journal of Materials Chemistry C. 4, 19, p. 4204-4210 7 p.

Research output: Research - peer-reviewArticle

Porous silicon
Current density
Silicon
Surface-Active Agents
Surface active agents
2 Citations

Understanding acoustic cavitation for sonolytic degradation of p-cresol as a model contaminant

Balachandran, R., Patterson, Z., Deymier, P., Snyder, S. A. & Keswani, M. Mar 1 2016 In : Chemosphere. 147, p. 52-59 8 p.

Research output: Research - peer-reviewArticle

Cavitation
Hydroxyl Radical
Acoustics
Impurities
Degradation
2015
1 Citations

Characterization of cavitation in ultrasonic or megasonic irradiated gas saturated solutions using a hydrophone

Zhao, M., Balachandran, R., Madigappu, P. R., Yam, P., Zanelli, C., Sierra, R. & Keswani, M. 2015 Solid State Phenomena. Trans Tech Publications Ltd, Vol. 219, p. 165-169 5 p. (Solid State Phenomena; vol. 219)

Research output: ResearchConference contribution

3 Citations

Characterization of stable and transient cavitation in megasonically irradiated aqueous solutions

Balachandran, R., Zhao, M., Yam, P., Zanelli, C. & Keswani, M. Feb 5 2015 In : Microelectronic Engineering. 133, p. 45-50 6 p.

Research output: Research - peer-reviewArticle

cavitation flow
aqueous solutions
Cavitation
cleaning
Cleaning
2 Citations

Contactless bottom-up electrodeposition of nickel for 3D integrated circuits

Zhao, M., Balachandran, R., Patterson, Z., Gouk, R., Verhaverbeke, S., Shadman, F. & Keswani, M. 2015 In : RSC Advances. 5, 56, p. 45291-45299 9 p.

Research output: Research - peer-reviewArticle

Nickel
Electrodeposition
Three dimensional integrated circuits
Silicon
Deposition rates
7 Citations

Effect of sound frequency and initial concentration on the sonochemical degradation of perfluorooctane sulfonate (PFOS)

Rodriguez-Freire, L., Balachandran, R., Sierra-Alvarez, R. & Keswani, M. Dec 1 2015 In : Journal of Hazardous Materials. 300, p. 662-669 8 p.

Research output: Research - peer-reviewArticle

sulfonate
degradation
sound
effect
Acoustic waves
3 Citations

Investigations of solution variables in a contactless copper electrodeposition process for 3D packaging applications

Weber, C., Patterson, Z., Zhao, M., Balachandran, R., Gouk, R., Verhaverbeke, S., Shadman, F. & Keswani, M. 2015 In : Materials Science in Semiconductor Processing. 30, p. 578-584 7 p.

Research output: Research - peer-reviewArticle

Electrodeposition
Copper
Packaging
packaging
electrodeposition
1 Citations

Megasonic Cleaning for Particle Removal

Keswani, M., Balachandran, R. & Deymier, P. Feb 6 2015 Particle Adhesion and Removal. wiley, p. 243-279 37 p.

Research output: ResearchChapter

Cleaning
Cavitation
Liquids
Acoustic streaming
Acoustic fields

Nanoparticle Adhesion and Removal

Keswani, M. Sep 3 2015 In : Particulate Science and Technology. 33, 5, p. 522-523 2 p.

Research output: Research - peer-reviewArticle

2 Citations

Synthesis of porous silicon through interfacial reactions and measurement of its electrochemical response using cyclic voltammetry

Zhao, M., Balachandran, R., Allred, J. & Keswani, M. Sep 7 2015 In : RSC Advances. 5, 96, p. 79157-79163 7 p.

Research output: Research - peer-reviewArticle

Porous silicon
Surface chemistry
Cyclic voltammetry
Silicon
Anodic polarization
2014
3 Citations
Sonoluminescence
Hydroxyl Radical
Gases
Ammonium Hydroxide
Photomultipliers
4 Citations
Tantalum
Cleaning
Argon
Electrochemistry
Silicon Dioxide
3 Citations
cavitation flow
cleaning
bubbles
water
Bubbles (in fluids)
2 Citations

Enhanced megasonic processing of wafers in MegPie® using carbonated ammonium hydroxide solutions

Kumari, S., Keswani, M., Singh, S., Beck, M., Liebscher, E. & Raghavan, S. Feb 2014 In : Microelectronic Engineering. 114, p. 148-153 6 p.

Research output: Research - peer-reviewArticle

hydroxides
wafers
Ammonium hydroxide
Cleaning
Processing
4 Citations
Tantalum
Polysilicon
Nitrides
Corrosion
Silicon
7 Citations

Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

Keswani, M., Raghavan, S., Govindarajan, R. & Brown, I. Apr 25 2014 In : Microelectronic Engineering. 118, p. 61-65 5 p.

Research output: Research - peer-reviewArticle

hydroxyl radicals
cleaning
wafers
Hydroxyl Radical
Cleaning

Role of ammonia and carbonates in scavenging hydroxyl radicals generated during megasonic irradiation of wafer cleaning solutions

Balachandran, R., Zhao, M., Dong, B., Brown, I., Raghavan, S. & Keswani, M. Nov 25 2014 In : Microelectronic Engineering. 130, p. 82-86 5 p.

Research output: Research - peer-reviewArticle

scavenging
hydroxyl radicals
cleaning
ammonia
carbonates
2013
2 Citations
cavitation flow
solid surfaces
cleaning
impedance
spectroscopy
3 Citations

A study of hydrogen peroxide decomposition in ammonia-peroxide mixtures (APM)

Siddiqui, S., Keswani, M., Brooks, B., Fuerst, A. & Raghavan, S. Feb 2013 In : Microelectronic Engineering. 102, p. 68-73 6 p.

Research output: Research - peer-reviewArticle

Peroxides
Ammonia
Hydrogen Peroxide
Decomposition
Hydrogen peroxide
14 Citations
cavitation flow
gases
Cavitation
Cyclic voltammetry
Gases
11 Citations

Effect of non-ionic surfactants on transient cavitation in a megasonic field

Keswani, M., Raghavan, S. & Deymier, P. Jan 2013 In : Ultrasonics Sonochemistry. 20, 1, p. 603-609 7 p.

Research output: Research - peer-reviewArticle

Nonionic surfactants
Cavitation
cavitation flow
surfactants
cavities
9 Citations
blankets
cleaning
ammonia
damage
Ammonia
1 Citations

New plasmonic materials in visible spectrum through electrical charging

Cao, J., Balachandran, R., Keswani, M., Muralidharan, K., Laref, S., Ziolkowski, R., Runge, K., Deymier, P., Raghavan, S. & Miyawaki, M. 2013 Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8632, 86321I

Research output: ResearchConference contribution

visible spectrum
engineers
charging
permittivity
gold
7 Citations

Post-etch residue removal using choline chloride-malonic acid deep eutectic solvent (DES)

Taubert, J., Keswani, M. & Raghavan, S. Feb 2013 In : Microelectronic Engineering. 102, p. 81-86 6 p.

Research output: Research - peer-reviewArticle

choline
eutectics
chlorides
acids
Choline
Sonoluminescence
Cavitation
Ammonium hydroxide
Photomultipliers
Fused silica
2012
1 Citations

Comparison of gold particle removal from fused silica and thermal oxide surfaces in dilute ammonium hydroxide solutions

Pandit, V., Keswani, M., Siddiqui, S. & Raghavan, S. 2012 Solid State Phenomena. Trans Tech Publications Ltd, Vol. 187, p. 159-162 4 p. (Solid State Phenomena; vol. 187)

Research output: ResearchConference contribution

Ammonium hydroxide
Fused silica
Gold
Oxides
Hot Temperature
1 Citations

Control of sonoluminescence in carbon dioxide containing DI water at near neutral pH conditions

Kumari, S., Keswani, M., Singh, S. K., Beck, M., Leibscher, E., Deymier, P. & Raghavan, S. 2012 Solid State Phenomena. Trans Tech Publications Ltd, Vol. 187, p. 177-180 4 p. (Solid State Phenomena; vol. 187)

Research output: ResearchConference contribution

Sonoluminescence
Carbon dioxide
Water
sonoluminescence
carbon dioxide
2 Citations

Dynamics of interactions between HF and hafnium oxide during surface preparation of high-k dielectrics

Zamani, D., Keswani, M., Mahdavi, O., Yan, J., Raghavan, S. & Shadman, F. 2012 In : IEEE Transactions on Semiconductor Manufacturing. 25, 3, p. 511-515 5 p., 6189800

Research output: Research - peer-reviewArticle

hafnium oxides
quartz crystals
microbalances
desorption
preparation
peroxides
hydrogen peroxide
pretreatment
crusts
dosage
3 Citations
choline
ureas
eutectics
chlorides
copper
2011
19 Citations

Control of sonoluminescence signal in deionized water using carbon dioxide

Kumari, S., Keswani, M., Singh, S., Beck, M., Liebscher, E., Deymier, P. & Raghavan, S. Dec 2011 In : Microelectronic Engineering. 88, 12, p. 3437-3441 5 p.

Research output: Research - peer-reviewArticle

sonoluminescence
carbon dioxide
water
Sonoluminescence
Deionized water
1 Citations

Determining the fundamental kinetic parameters for rinsing and cleaning of hafnium-based high-k materials

Zamani, D., Keswani, M., Yan, J., Raghavan, S. & Shadman, F. 2011 ECS Transactions. 5 ed. Vol. 41, p. 45-50 6 p.

Research output: ResearchConference contribution

Hafnium
Quartz crystal microbalances
Kinetic parameters
Cleaning
Desorption
17 Citations

Effect of dissolved CO 2 in de-ionized water in reducing wafer damage during megasonic cleaning in MegPie®

Kumari, S., Keswani, M., Singh, S., Beck, M., Liebscher, E., Toan, L. Q. & Raghavan, S. 2011 ECS Transactions. 5 ed. Vol. 41, p. 93-99 7 p.

Research output: ResearchConference contribution

Cleaning
Water
Acoustic waves
Irradiation
Sonoluminescence
3 Citations

Electrochemical mechanical removal of Ta films in dihydroxybenzene sulfonic acid solutions containing potassium iodate

Govindarajan, R., Siddiqui, S., Keswani, M., Raghavan, S., Singh, D. R. P. & Chawla, N. 2011 In : Electrochemical and Solid-State Letters. 14, 4

Research output: Research - peer-reviewArticle

iodates
sulfonic acid
potassium
Potassium
Acids
3 Citations

Investigation of galvanic corrosion characteristics between tantalum nitride and poly silicon in dilute hf solutions

Govindarajan, R., Keswani, M. & Raghavan, S. 2011 ECS Transactions. 5 ed. Vol. 41, p. 15-21 7 p.

Research output: ResearchConference contribution

Tantalum
Nitrides
Corrosion
Silicon
Polysilicon
4 Citations

Post plasma etch residue removal in dilute HF solutions

Thanu, D. P. R., Raghavan, S. & Keswani, M. Aug 2011 In : Journal of the Electrochemical Society. 158, 8

Research output: Research - peer-reviewArticle

Plasmas
Copper
copper
cresol
Fluorine
bubbles
Electrodes
Acoustic streaming
electrodes
acoustic streaming
7 Citations
peroxides
ammonia
microscopes
silicon
interactions
1 Citations

Surface and Colloidal Chemical Aspects of Wet Cleaning

Raghavan, S., Keswani, M. & Venkataraman, N. Feb 22 2011 Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications. John Wiley and Sons, p. 3-37 35 p.

Research output: ResearchChapter

Cleaning
Drying
Chemical cleaning
Zeta potential
Nitrides
9 Citations
choline
ureas
eutectics
cleaning
chlorides