Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

  • 2 Similar Profiles
Cleaning Engineering & Materials Science
Copper Engineering & Materials Science
cleaning Physics & Astronomy
copper Physics & Astronomy
silicon Physics & Astronomy
wafers Physics & Astronomy
Silicon Engineering & Materials Science
Oxides Engineering & Materials Science

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Research Output 1983 2017

  • 1577 Citations
  • 21 h-Index
  • 118 Article
  • 40 Conference contribution
  • 8 Chapter
  • 1 Review article

Effect of surface preparation of copper on spin-coating driven self- assembly of fullerene molecules

Ma, D., Sandoval, S., Muralidharan, K. & Raghavan, S. Feb 25 2017 In : Microelectronic Engineering. 170, p. 8-15 8 p.

Research output: Research - peer-reviewArticle

fullerenes
coating
self assembly
rods
copper

Electrocoagulation driven fabrication of graphene oxide films

Weisbart, C., Raghavan, S., Muralidharan, K. & Potter, B. G. May 1 2017 In : Carbon. 116, p. 318-324 7 p.

Research output: Research - peer-reviewArticle

Graphite
Oxide films
Fabrication
Copper
Anodes

Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices

Siddiqui, S., Dai, M., Loesing, R., Kaltalioglu, E., Pandey, R., Sathiyanarayanan, R., De, S., Raghavan, S. & Parks, H. Jan 1 2017 In : Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 35, 1, 012202

Research output: Research - peer-reviewArticle

oxynitrides
oxygen plasma
fins
high voltages
field effect transistors

Rinsing of high-aspect-ratio features on patterned wafers

Chiang, C. C., Kishore, J., Raghavan, S. & Shadman, F. Feb 1 2017 In : IEEE Transactions on Semiconductor Manufacturing. 30, 1, p. 60-68 9 p., 7586061

Research output: Research - peer-reviewArticle

high aspect ratio
wafers
Aspect ratio
surface reactions
cleaning

Review-understanding and controlling electrochemical effects in wet processing

Raghavan, S. & Chiang, C. C. 2016 In : ECS Journal of Solid State Science and Technology. 5, 6, p. P309-P314

Research output: Research - peer-reviewReview article

Processing
Passivation
Integrated circuits
Etching
Cleaning