• 1858 Citations
  • 22 h-Index
1983 …2019
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Fingerprint Dive into the research topics where Srini Raghavan is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 2 Similar Profiles
Cleaning Engineering & Materials Science
Copper Chemical Compounds
cleaning Physics & Astronomy
Silicon Chemical Compounds
Chemical mechanical polishing Engineering & Materials Science
copper Physics & Astronomy
wafers Physics & Astronomy
Oxides Chemical Compounds

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Research Output 1983 2019

  • 1858 Citations
  • 22 h-Index
  • 120 Article
  • 40 Conference contribution
  • 8 Chapter
  • 1 Review article
2 Citations (Scopus)
Open Access
Chemical mechanical polishing
Quartz crystal microbalances
Copper
Copper corrosion
Adsorption
1 Citation (Scopus)

Effect of surface preparation of copper on spin-coating driven self- assembly of fullerene molecules

Ma, D., Sandoval, S., Muralidharan, K. & Raghavan, S., Feb 25 2017, In : Microelectronic Engineering. 170, p. 8-15 8 p.

Research output: Contribution to journalArticle

Fullerenes
Spin coating
Self assembly
fullerenes
coating
2 Citations (Scopus)

Electrocoagulation driven fabrication of graphene oxide films

Weisbart, C., Raghavan, S., Muralidharan, K. & Potter, B. G., May 1 2017, In : Carbon. 116, p. 318-324 7 p.

Research output: Contribution to journalArticle

Graphite
Graphene
Oxide films
Fabrication
Copper
2 Citations (Scopus)

Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices

Siddiqui, S., Dai, M., Loesing, R., Kaltalioglu, E., Pandey, R., Sathiyanarayanan, R., De, S., Raghavan, S. & Parks, H., Jan 1 2017, In : Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 35, 1, 012202.

Research output: Contribution to journalArticle

oxynitrides
oxygen plasma
fins
Field effect transistors
Electric breakdown
1 Citation (Scopus)

Rinsing of high-aspect-ratio features on patterned wafers

Chiang, C. C., Kishore, J., Raghavan, S. & Shadman, F., Feb 1 2017, In : IEEE Transactions on Semiconductor Manufacturing. 30, 1, p. 60-68 9 p., 7586061.

Research output: Contribution to journalArticle

high aspect ratio
Aspect ratio
wafers
surface reactions
cleaning