The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.
|Original language||English (US)|
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Dec 11 2008|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering