A new approach to fabricating high density nanoarrays by nanocontact printing

Jian Gu, Xiaoyin Xiao, Bharath R. Takulapalli, Michael E. Morrison, Peiming Zhang, Frederic Zenhausern

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.

Original languageEnglish (US)
Pages (from-to)1860-1865
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume26
Issue number6
DOIs
StatePublished - 2008

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printing
Printing
Nanoimprint lithography
Masks
Multilayers
Microscopes
masks
lithography
alignment
microscopes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

A new approach to fabricating high density nanoarrays by nanocontact printing. / Gu, Jian; Xiao, Xiaoyin; Takulapalli, Bharath R.; Morrison, Michael E.; Zhang, Peiming; Zenhausern, Frederic.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 6, 2008, p. 1860-1865.

Research output: Contribution to journalArticle

Gu, Jian ; Xiao, Xiaoyin ; Takulapalli, Bharath R. ; Morrison, Michael E. ; Zhang, Peiming ; Zenhausern, Frederic. / A new approach to fabricating high density nanoarrays by nanocontact printing. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008 ; Vol. 26, No. 6. pp. 1860-1865.
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