A new modified HF-last cleaning process for high-performance gate dielectrics

S. Verhaverbekc, M. Meuris, M. Schaekers, L. Haspeslagh, P. Mertens, M. M. Heyns, R. De Blank, A. Philipossian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

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Engineering & Materials Science