Achieving enhanced gain in photorefractive polymers by eliminating electron contributions using large bias fields

C. M. Liebig, S. H. Buller, P. P. Banerjee, S. A. Basun, Pierre Alexandre Blanche, J. Thomas, C. W. Christenson, Nasser N Peyghambarian, D. R. Evans

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Photorefractive polymers have been extensively studied for over two decades and have found applications in holographic displays and optical image processing. The complexity of these materials arises from multiple charge contributions, for example, leading to the formation of competing photorefractive gratings. It has been recently shown that in a photorefractive polymer at relatively moderate applied electric fields the primary charge carriers (holes) establish an initial grating, followed by a subsequent competing grating (electrons) resulting in a decreased two-beam coupling and diffraction efficiencies. In this paper, it is shown that with relatively large sustainable bias fields, the two-beam coupling efficiency is enhanced owing to a decreased electron contribution. These results also explain the cause of dielectric breakdown experienced under large bias fields. Our conclusions are supported by self-pumped transient two-beam coupling and photocurrent measurements as a function of applied bias fields at different wavelengths.

Original languageEnglish (US)
Pages (from-to)30392-30400
Number of pages9
JournalOptics Express
Volume21
Issue number25
DOIs
StatePublished - Dec 16 2013

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gratings
polymers
electrons
photocurrents
image processing
charge carriers
breakdown
electric fields
causes
diffraction
wavelengths

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Liebig, C. M., Buller, S. H., Banerjee, P. P., Basun, S. A., Blanche, P. A., Thomas, J., ... Evans, D. R. (2013). Achieving enhanced gain in photorefractive polymers by eliminating electron contributions using large bias fields. Optics Express, 21(25), 30392-30400. https://doi.org/10.1364/OE.21.030392

Achieving enhanced gain in photorefractive polymers by eliminating electron contributions using large bias fields. / Liebig, C. M.; Buller, S. H.; Banerjee, P. P.; Basun, S. A.; Blanche, Pierre Alexandre; Thomas, J.; Christenson, C. W.; Peyghambarian, Nasser N; Evans, D. R.

In: Optics Express, Vol. 21, No. 25, 16.12.2013, p. 30392-30400.

Research output: Contribution to journalArticle

Liebig, CM, Buller, SH, Banerjee, PP, Basun, SA, Blanche, PA, Thomas, J, Christenson, CW, Peyghambarian, NN & Evans, DR 2013, 'Achieving enhanced gain in photorefractive polymers by eliminating electron contributions using large bias fields', Optics Express, vol. 21, no. 25, pp. 30392-30400. https://doi.org/10.1364/OE.21.030392
Liebig, C. M. ; Buller, S. H. ; Banerjee, P. P. ; Basun, S. A. ; Blanche, Pierre Alexandre ; Thomas, J. ; Christenson, C. W. ; Peyghambarian, Nasser N ; Evans, D. R. / Achieving enhanced gain in photorefractive polymers by eliminating electron contributions using large bias fields. In: Optics Express. 2013 ; Vol. 21, No. 25. pp. 30392-30400.
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