Acid-catalyzed dehydration for the design of chemical amplification resists

H. Ito, R. Sooriyakumaran, Y. Maekawa, Eugene A Mash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations

Abstract

Chemical amplification (3) based on radiation-induced acidolysis is a very attractive approach to dramatically increasing radiation sensitivities of resist systems for use in short wavelength lithographic technologies. Polarity reversal has been also utilized in the chemical amplification scheme. In this paper is reported another approach to achieving the reverse polarity change. The chemical amplification resists described in this paper are based on acid-catalyzed dehydration of alcohols to olefins.

Original languageEnglish (US)
Title of host publicationPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
PublisherPubl by ACS
Pages45-46
Number of pages2
Volume66
ISBN (Print)0841222169
Publication statusPublished - 1992
Externally publishedYes

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ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics

Cite this

Ito, H., Sooriyakumaran, R., Maekawa, Y., & Mash, E. A. (1992). Acid-catalyzed dehydration for the design of chemical amplification resists. In Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering (Vol. 66, pp. 45-46). Publ by ACS.