Acoustic characterization of two megasonic devices for photomask cleaning

Claudio Zanelli, Dushyanth Giridhar, Manish Keswani, Nagaya Okada, Jyhwei Hsu, Petrie Yam

Research output: ResearchConference contribution

LanguageEnglish (US)
Title of host publicationPhotomask Technology 2016
PublisherSPIE
Volume9985
ISBN (Electronic)9781510603745
DOIs
StatePublished - 2016
EventPhotomask Technology 2016 - San Jose, United States
Duration: Sep 12 2016Sep 14 2016

Other

OtherPhotomask Technology 2016
CountryUnited States
CitySan Jose
Period9/12/169/14/16

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Zanelli, C., Giridhar, D., Keswani, M., Okada, N., Hsu, J., & Yam, P. (2016). Acoustic characterization of two megasonic devices for photomask cleaning. In Photomask Technology 2016 (Vol. 9985). [998524] SPIE. DOI: 10.1117/12.2243124

Acoustic characterization of two megasonic devices for photomask cleaning. / Zanelli, Claudio; Giridhar, Dushyanth; Keswani, Manish; Okada, Nagaya; Hsu, Jyhwei; Yam, Petrie.

Photomask Technology 2016. Vol. 9985 SPIE, 2016. 998524.

Research output: ResearchConference contribution

Zanelli, C, Giridhar, D, Keswani, M, Okada, N, Hsu, J & Yam, P 2016, Acoustic characterization of two megasonic devices for photomask cleaning. in Photomask Technology 2016. vol. 9985, 998524, SPIE, Photomask Technology 2016, San Jose, United States, 9/12/16. DOI: 10.1117/12.2243124
Zanelli C, Giridhar D, Keswani M, Okada N, Hsu J, Yam P. Acoustic characterization of two megasonic devices for photomask cleaning. In Photomask Technology 2016. Vol. 9985. SPIE. 2016. 998524. Available from, DOI: 10.1117/12.2243124
Zanelli, Claudio ; Giridhar, Dushyanth ; Keswani, Manish ; Okada, Nagaya ; Hsu, Jyhwei ; Yam, Petrie. / Acoustic characterization of two megasonic devices for photomask cleaning. Photomask Technology 2016. Vol. 9985 SPIE, 2016.
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