Acoustic characterization of two megasonic devices for photomask cleaning

Claudio Zanelli, Dushyanth Giridhar, Manish K Keswani, Nagaya Okada, Jyhwei Hsu, Petrie Yam

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationPhotomask Technology 2016
PublisherSPIE
Volume9985
ISBN (Electronic)9781510603745
DOIs
Publication statusPublished - 2016
EventPhotomask Technology 2016 - San Jose, United States
Duration: Sep 12 2016Sep 14 2016

Other

OtherPhotomask Technology 2016
CountryUnited States
CitySan Jose
Period9/12/169/14/16

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Zanelli, C., Giridhar, D., Keswani, M. K., Okada, N., Hsu, J., & Yam, P. (2016). Acoustic characterization of two megasonic devices for photomask cleaning. In Photomask Technology 2016 (Vol. 9985). [998524] SPIE. https://doi.org/10.1117/12.2243124