TY - JOUR
T1 - Advances in lithography
T2 - Introduction to the feature
AU - Erdmann, Andreas
AU - Liang, Rongguang
AU - Sezginer, Apo
AU - Smith, Bruce
N1 - Publisher Copyright:
© 2014 Optical Society of America.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2014/12/1
Y1 - 2014/12/1
N2 - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.
AB - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.
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U2 - 10.1364/JOSAA.31.000LI1
DO - 10.1364/JOSAA.31.000LI1
M3 - Review article
AN - SCOPUS:84942373709
VL - 31
SP - L11-L12
JO - Journal of the Optical Society of America A: Optics and Image Science, and Vision
JF - Journal of the Optical Society of America A: Optics and Image Science, and Vision
SN - 1084-7529
IS - 12
ER -