Abstract
Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.
| Original language | English (US) |
|---|---|
| Pages (from-to) | L11-L12 |
| Journal | Journal of the Optical Society of America A: Optics and Image Science, and Vision |
| Volume | 31 |
| Issue number | 12 |
| DOIs | |
| State | Published - Dec 1 2014 |
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ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Electronic, Optical and Magnetic Materials
- Computer Vision and Pattern Recognition
Cite this
Advances in lithography : Introduction to the feature. / Erdmann, Andreas; Liang, Rongguang; Sezginer, Apo; Smith, Bruce.
In: Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol. 31, No. 12, 01.12.2014, p. L11-L12.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Advances in lithography
T2 - Introduction to the feature
AU - Erdmann, Andreas
AU - Liang, Rongguang
AU - Sezginer, Apo
AU - Smith, Bruce
PY - 2014/12/1
Y1 - 2014/12/1
N2 - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.
AB - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.
UR - http://www.scopus.com/inward/record.url?scp=84942373709&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84942373709&partnerID=8YFLogxK
U2 - 10.1364/JOSAA.31.000LI1
DO - 10.1364/JOSAA.31.000LI1
M3 - Article
AN - SCOPUS:84942373709
VL - 31
SP - L11-L12
JO - Journal of the Optical Society of America A: Optics and Image Science, and Vision
JF - Journal of the Optical Society of America A: Optics and Image Science, and Vision
SN - 1084-7529
IS - 12
ER -