Advances in lithography: Introduction to the feature

Andreas Erdmann, Rongguang Liang, Apo Sezginer, Bruce Smith

Research output: Contribution to journalArticle

Abstract

Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

Original languageEnglish (US)
Pages (from-to)L11-L12
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume31
Issue number12
DOIs
StatePublished - Dec 1 2014

Fingerprint

Masks
Lithography
masks
lithography
Miniaturization
Fresnel lenses
Semiconductors
miniaturization
Wavefronts
Semiconductor devices
semiconductor devices
Inverse problems
Lenses
retrieval
coverings
projection
Technology
Equipment and Supplies
optimization
Research

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Computer Vision and Pattern Recognition

Cite this

Advances in lithography : Introduction to the feature. / Erdmann, Andreas; Liang, Rongguang; Sezginer, Apo; Smith, Bruce.

In: Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol. 31, No. 12, 01.12.2014, p. L11-L12.

Research output: Contribution to journalArticle

@article{f9055cc239d34dbe9307cb6f4c3c0db6,
title = "Advances in lithography: Introduction to the feature",
abstract = "Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.",
author = "Andreas Erdmann and Rongguang Liang and Apo Sezginer and Bruce Smith",
year = "2014",
month = "12",
day = "1",
doi = "10.1364/JOSAA.31.000LI1",
language = "English (US)",
volume = "31",
pages = "L11--L12",
journal = "Journal of the Optical Society of America A: Optics and Image Science, and Vision",
issn = "1084-7529",
publisher = "The Optical Society",
number = "12",

}

TY - JOUR

T1 - Advances in lithography

T2 - Introduction to the feature

AU - Erdmann, Andreas

AU - Liang, Rongguang

AU - Sezginer, Apo

AU - Smith, Bruce

PY - 2014/12/1

Y1 - 2014/12/1

N2 - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

AB - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

UR - http://www.scopus.com/inward/record.url?scp=84942373709&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84942373709&partnerID=8YFLogxK

U2 - 10.1364/JOSAA.31.000LI1

DO - 10.1364/JOSAA.31.000LI1

M3 - Article

AN - SCOPUS:84942373709

VL - 31

SP - L11-L12

JO - Journal of the Optical Society of America A: Optics and Image Science, and Vision

JF - Journal of the Optical Society of America A: Optics and Image Science, and Vision

SN - 1084-7529

IS - 12

ER -