Advances in lithography: Introduction to the feature

Andreas Erdmann, Rongguang Liang, Apo Sezginer, Bruce Smith

Research output: Contribution to journalArticle

Abstract

Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

Original languageEnglish (US)
Pages (from-to)L11-L12
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume31
Issue number12
DOIs
StatePublished - Dec 1 2014

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Computer Vision and Pattern Recognition

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