Advances in lithography: Introduction to the feature

Andreas Erdmann, Rongguang Liang, Apo Sezginer, Bruce Smith

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

Original languageEnglish (US)
Pages (from-to)LI1-LI2
JournalApplied Optics
Volume53
Issue number34
DOIs
StatePublished - Dec 1 2014

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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