Advances in optical metrology and instrumentation: introduction

Jonathan D. Ellis, Han Haitjema, Xiangqian Jiang, Ki Nam Joo, Richard Leach

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Optical measurement and characterization are two of the pillars of metrology. The ability to measure precisely with high dynamic range and accuracy betters our understanding of nature and the universe. In this feature issue, we present a collection of articles that delves into the fundamental techniques used to advance the field.

Original languageEnglish (US)
Pages (from-to)OMI1-OMI2
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume37
Issue number9
DOIs
StatePublished - Sep 2019
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Computer Vision and Pattern Recognition

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