Advances in Polarization Metrology

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Three new polarimeters are described which represent advances in polarization metrology capabilities. Two are at a new polarization laboratory started at the University of Arizona's Optical Sciences Center, (1) a Fiber Optic Spectropolarimeter and (2) a High Speed Mueller Matrix Imaging Polarimeter. The third is a new visible Mueller Matrix Spectropolarimeter for optical component test from a startup company, Axometrics, which is useful for detailed characterization of optical components and thin films via spectra of diattenuation, retardance, and depolarization.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsJ.M. Sasian, R.J. Koshel, P.K. Manhart
Pages43-50
Number of pages8
Volume5174
DOIs
StatePublished - 2003
EventNovel Optical Systems Design and Optimization VI - San Diego, CA, United States
Duration: Aug 4 2003Aug 4 2003

Other

OtherNovel Optical Systems Design and Optimization VI
CountryUnited States
CitySan Diego, CA
Period8/4/038/4/03

Fingerprint

Polarimeters
polarimeters
metrology
Polarization
Depolarization
polarization
Fiber optics
Imaging techniques
Thin films
matrices
depolarization
fiber optics
Industry
high speed
thin films

Keywords

  • Depolarization
  • Diattenuation
  • Metrology
  • Mueller matrices
  • Polarimetry
  • Polarization dependent loss
  • Polarizers
  • Retardance
  • Retarders

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Chipman, R. A. (2003). Advances in Polarization Metrology. In J. M. Sasian, R. J. Koshel, & P. K. Manhart (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5174, pp. 43-50) https://doi.org/10.1117/12.511279

Advances in Polarization Metrology. / Chipman, Russell A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / J.M. Sasian; R.J. Koshel; P.K. Manhart. Vol. 5174 2003. p. 43-50.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chipman, RA 2003, Advances in Polarization Metrology. in JM Sasian, RJ Koshel & PK Manhart (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5174, pp. 43-50, Novel Optical Systems Design and Optimization VI, San Diego, CA, United States, 8/4/03. https://doi.org/10.1117/12.511279
Chipman RA. Advances in Polarization Metrology. In Sasian JM, Koshel RJ, Manhart PK, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5174. 2003. p. 43-50 https://doi.org/10.1117/12.511279
Chipman, Russell A. / Advances in Polarization Metrology. Proceedings of SPIE - The International Society for Optical Engineering. editor / J.M. Sasian ; R.J. Koshel ; P.K. Manhart. Vol. 5174 2003. pp. 43-50
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