Analyses of diamond disk substrate wear and diamond microwear in copper chemical mechanical planarization process

Anand Meled, Yun Zhuang, Xiaomin Wei, Jiang Cheng, Yasa Adi Sampurno, Leonard Borucki, Mansour Moinpour, Don Hooper, Ara Philipossian

Research output: Contribution to journalArticle

12 Scopus citations

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy