Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing

George Nehmetallah, John Donoghue, Partha Banerjee, Jed Khoury, Michiharu Yamamoto, Nasser N Peyghambarian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this work, brief theoretical modeling, analysis, and novel numerical verification of a photorefractive polymer based four wave mixing (FWM) setup for defect detection has been developed. The numerical simulation helps to validate our earlier experimental results to perform defect detection in periodic amplitude and phase objects using FWM. Specifically, we develop the theory behind the detection of isolated defects, and random defects in amplitude, and phase periodic patterns. In accordance with the developed theory, the results show that this technique successfully detects the slightest defects through band-pass intensity filtering and requires minimal additional post image processing contrast enhancement. This optical defect detection technique can be applied to the detection of production line defects, e.g., scratch enhancement, defect cluster enhancement, and periodic pattern dislocation enhancement. This technique is very useful in quality control systems, production line defect inspection, and computer vision.

Original languageEnglish (US)
Title of host publicationOptical Pattern Recognition XXVII
PublisherSPIE
Volume9845
ISBN (Electronic)9781510600867
DOIs
StatePublished - 2016
EventOptical Pattern Recognition XXVII - Baltimore, United States
Duration: Apr 20 2016Apr 21 2016

Other

OtherOptical Pattern Recognition XXVII
CountryUnited States
CityBaltimore
Period4/20/164/21/16

Fingerprint

Four-wave Mixing
Defect Detection
Four wave mixing
Phase structure
four-wave mixing
Defects
defects
Production Line
Enhancement
Defect Inspection
Numerical Verification
augmentation
Contrast Enhancement
Quality Control
Dislocation
Computer Vision
Image Processing
Polymers
Filtering
Computer vision

Keywords

  • defect detection
  • four-wave mixing
  • Pattern recognition
  • photorefractive material

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Nehmetallah, G., Donoghue, J., Banerjee, P., Khoury, J., Yamamoto, M., & Peyghambarian, N. N. (2016). Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing. In Optical Pattern Recognition XXVII (Vol. 9845). [98450Q] SPIE. https://doi.org/10.1117/12.2221911

Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing. / Nehmetallah, George; Donoghue, John; Banerjee, Partha; Khoury, Jed; Yamamoto, Michiharu; Peyghambarian, Nasser N.

Optical Pattern Recognition XXVII. Vol. 9845 SPIE, 2016. 98450Q.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nehmetallah, G, Donoghue, J, Banerjee, P, Khoury, J, Yamamoto, M & Peyghambarian, NN 2016, Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing. in Optical Pattern Recognition XXVII. vol. 9845, 98450Q, SPIE, Optical Pattern Recognition XXVII, Baltimore, United States, 4/20/16. https://doi.org/10.1117/12.2221911
Nehmetallah G, Donoghue J, Banerjee P, Khoury J, Yamamoto M, Peyghambarian NN. Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing. In Optical Pattern Recognition XXVII. Vol. 9845. SPIE. 2016. 98450Q https://doi.org/10.1117/12.2221911
Nehmetallah, George ; Donoghue, John ; Banerjee, Partha ; Khoury, Jed ; Yamamoto, Michiharu ; Peyghambarian, Nasser N. / Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing. Optical Pattern Recognition XXVII. Vol. 9845 SPIE, 2016.
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