We report a new grating fabrication technique for optical devices in the InP/InGaAsP system. Conventional, but very shallow, holographically defined wet etching is used to pattern ultrathin masking layers grown by chemical beam epitaxy. This is followed by selective and anisotropic wet etching, which is shown to yield exceptionally deep, narrow-pitch gratings with reproducible profiles and dimensions.
ASJC Scopus subject areas
- Physics and Astronomy(all)