Anti-reflection coatings for silicon ultraviolet detectors

Erika Hamden, Jordana Blacksberg, Blake Jacquot, Todd Jones, Michael Hoenk, Matt Dickie, Shouleh Nikzad, David Schiminovich

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report on the development of UV anti-reflection coatings for silicon CCDs, optimized for use in a UV spectrograph. Typical UV detectors have very low quantum efficiency. We report on progress in the development of a CCD detector with theoretical QE of greater than 60% in wavelengths from 100 to 300nm. This high efficiency may be reached by coating a backside illuminated, thinned, delta-doped CCD with a thin film anti-reflection coating. We discuss coatings covering the entire range of interest using sputtered and thermally evaporated MgF, HfO2, SiO2, MgO, and Al2O3. Preliminary testing has shown great promise for this method.

Original languageEnglish (US)
Title of host publicationOptical Interference Coatings, OIC 2010
StatePublished - Dec 1 2010
Externally publishedYes
EventOptical Interference Coatings, OIC 2010 - Tucson, AZ, United States
Duration: Jun 6 2010Jun 11 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceOptical Interference Coatings, OIC 2010
CountryUnited States
CityTucson, AZ
Period6/6/106/11/10

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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