Applications of Raman spectroscopy in Cu CMP: In-situ detection of chemical species in the slurry

Siddartha Kondoju, Pierre Lucas, Srini Raghavan, Paul Fischer, Mansour Moinpour, Andrea Oehler

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Slurries used for copper CMP have a rich chemistry, which may change during the course of polishing due to consumption and decomposition of molecular species. Various aspects, such as small layer thickness (<50 μm), continuous flow of the slurry, and dynamics of the film removal process pose great challenge to the monitoring of slurry components between the pad and the wafer. The slurry constituents such as oxidants and corrosion inhibitors have unique signatures that can be detected using spectroscopic techniques. In this paper, work carried out to explore the use of Raman spectroscopy to detect and quantitate chemical species such as hydroxylamine, benzotriazole and hydrogen peroxide in-situ will be presented. More detailed study pertaining to the protonation of hydroxylamine with respect to the pH will also be presented. An abrasion cell integrated with a Raman spectrometer was used to make the measurements.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
Pages199-206
Number of pages8
Volume914
StatePublished - 2006
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 18 2006Apr 21 2006

Other

Other2006 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/18/064/21/06

Fingerprint

Cytidine Monophosphate
Hydroxylamine
Protonation
Slurries
Corrosion inhibitors
Polishing
Oxidants
Abrasion
Hydrogen peroxide
Raman spectroscopy
Spectrometers
Decomposition
Copper
Monitoring
Hydrogen Peroxide
benzotriazole

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Kondoju, S., Lucas, P., Raghavan, S., Fischer, P., Moinpour, M., & Oehler, A. (2006). Applications of Raman spectroscopy in Cu CMP: In-situ detection of chemical species in the slurry. In Materials Research Society Symposium Proceedings (Vol. 914, pp. 199-206)

Applications of Raman spectroscopy in Cu CMP : In-situ detection of chemical species in the slurry. / Kondoju, Siddartha; Lucas, Pierre; Raghavan, Srini; Fischer, Paul; Moinpour, Mansour; Oehler, Andrea.

Materials Research Society Symposium Proceedings. Vol. 914 2006. p. 199-206.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kondoju, S, Lucas, P, Raghavan, S, Fischer, P, Moinpour, M & Oehler, A 2006, Applications of Raman spectroscopy in Cu CMP: In-situ detection of chemical species in the slurry. in Materials Research Society Symposium Proceedings. vol. 914, pp. 199-206, 2006 MRS Spring Meeting, San Francisco, CA, United States, 4/18/06.
Kondoju S, Lucas P, Raghavan S, Fischer P, Moinpour M, Oehler A. Applications of Raman spectroscopy in Cu CMP: In-situ detection of chemical species in the slurry. In Materials Research Society Symposium Proceedings. Vol. 914. 2006. p. 199-206
Kondoju, Siddartha ; Lucas, Pierre ; Raghavan, Srini ; Fischer, Paul ; Moinpour, Mansour ; Oehler, Andrea. / Applications of Raman spectroscopy in Cu CMP : In-situ detection of chemical species in the slurry. Materials Research Society Symposium Proceedings. Vol. 914 2006. pp. 199-206
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