Balanced interferometric system for stability measurements

Jonathan D. Ellis, Ki Nam Joo, Jo W. Spronck, Robert H. Munnig Schmidt

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

We describe two different, double-sided interferometer designs for measuring material stability. Both designs are balanced interferometers where the only optical path difference is the sample and the reference beams are located within the interferometer. One interferometer is a double-pass design, whereas the other is a single-pass system. Based on a tolerancing analysis, the single-pass system is less susceptible to initial component misalignment and motions during experiments. This single-pass interferometer was tested with an 86 nm thin-film silver sample for both short-term repeatability and long-term stability. In 66 repeatability tests of 30 min each, the mean measured drift rate was less than 1 pm/h rms. In two long-term tests (>9 h), the mean drift rate was less than 1.1 pm/h, which shows good agreement between the short- and long-term measurements. In these experiments, the mean measured length change was 2 nm rms.

Original languageEnglish (US)
Pages (from-to)1733-1740
Number of pages8
JournalApplied optics
Volume48
Issue number9
DOIs
StatePublished - Mar 20 2009
Externally publishedYes

    Fingerprint

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

Cite this

Ellis, J. D., Joo, K. N., Spronck, J. W., & Munnig Schmidt, R. H. (2009). Balanced interferometric system for stability measurements. Applied optics, 48(9), 1733-1740. https://doi.org/10.1364/AO.48.001733