Behavior of polyethylene oxide based nonionic surfactants in silicon processing using alkaline solutions

Joong S. Jeon, Srini Raghavan, Roger P. Sperline

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

The adsorption of polyethylene oxide (PEO) based nonionic surfactants onto hydrophobic silicon from an alkaline solution was investigated using an in situ attenuated total reflection Fourier transform infrared spectroscopy technique. The adsorption/desorption profiles of surfactants were affected by the type and length of the hydrophobic group and the lengths of hydrophilic PEO chains. Complete wetting of hydrophobic silicon was measured at surfactant concentrations in the range of 50 to 200 ppm. Surfactant adsorption was controlled by hydrophobic attractions between the hydrophobic moiety of surfactant and the silicon surface. The addition of surfactant to alkaline solutions dramatically reduced the etch rate of silicon and resulted in a smoother silicon surface. Oxidizing treatments followed by buffered oxide etching (BOE) were effective in the complete removal of adsorbed surfactant.

Original languageEnglish (US)
Pages (from-to)621-627
Number of pages7
JournalJournal of the Electrochemical Society
Volume142
Issue number2
StatePublished - Feb 1995

Fingerprint

Nonionic surfactants
Silicon
Polyethylene oxides
Surface-Active Agents
polyethylenes
Surface active agents
surfactants
oxides
silicon
Processing
Adsorption
adsorption
Oxides
Fourier transform infrared spectroscopy
Wetting
Etching
Desorption
wetting
attraction
desorption

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Behavior of polyethylene oxide based nonionic surfactants in silicon processing using alkaline solutions. / Jeon, Joong S.; Raghavan, Srini; Sperline, Roger P.

In: Journal of the Electrochemical Society, Vol. 142, No. 2, 02.1995, p. 621-627.

Research output: Contribution to journalArticle

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