Biaxial ellipsometry

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Biaxial ellipsometry measures the optical constants of materials, anisotropic films, and stacks of anistropic films. Materials of interest include birefringent crystals, polarizing materials and films, and the complex multilayer anisotropic structures used in liquid crystal displays. An approach using Mueller matrix imaging polarimetry to simultaneously measure and angularly resolve reflection and transmission over large solid angles is presented. Biaxial materials have three refractive indices and three absorption coefficients in orthogonal directions but with arbitrary orientation. Determination of the dielectric tensor provides a succinct and suitable material representation, and its accurate determination is the focus of this investigation.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsJ.M. Sasian, R.J. Koshel, R.C. Juergens
Pages1-8
Number of pages8
Volume5875
DOIs
StatePublished - 2005
EventNovel Optical Systems Design and Optimization VIII - San Diego, CA, United States
Duration: Jul 31 2005Aug 1 2005

Other

OtherNovel Optical Systems Design and Optimization VIII
CountryUnited States
CitySan Diego, CA
Period7/31/058/1/05

Fingerprint

Ellipsometry
ellipsometry
polarimetry
absorptivity
liquid crystals
Polarimeters
tensors
Optical constants
refractivity
Liquid crystal displays
Tensors
matrices
Refractive index
Multilayers
crystals
Imaging techniques
Crystals

Keywords

  • Biaxial
  • Birefringent
  • Dichroism
  • Dielectric tensor
  • Ellipsometry
  • Polarimetry
  • Retardance

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Chipman, R. A. (2005). Biaxial ellipsometry. In J. M. Sasian, R. J. Koshel, & R. C. Juergens (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5875, pp. 1-8). [587506] https://doi.org/10.1117/12.623405

Biaxial ellipsometry. / Chipman, Russell A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / J.M. Sasian; R.J. Koshel; R.C. Juergens. Vol. 5875 2005. p. 1-8 587506.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chipman, RA 2005, Biaxial ellipsometry. in JM Sasian, RJ Koshel & RC Juergens (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5875, 587506, pp. 1-8, Novel Optical Systems Design and Optimization VIII, San Diego, CA, United States, 7/31/05. https://doi.org/10.1117/12.623405
Chipman RA. Biaxial ellipsometry. In Sasian JM, Koshel RJ, Juergens RC, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5875. 2005. p. 1-8. 587506 https://doi.org/10.1117/12.623405
Chipman, Russell A. / Biaxial ellipsometry. Proceedings of SPIE - The International Society for Optical Engineering. editor / J.M. Sasian ; R.J. Koshel ; R.C. Juergens. Vol. 5875 2005. pp. 1-8
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