Abstract
The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO 2 on silicon, and Si 3N 4 on silicon, and a multiple layer stack of SiO 2/poly- Si/SiO 2 on silicon.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Pages | 114-125 |
| Number of pages | 12 |
| Volume | 2439 |
| State | Published - 1995 |
| Externally published | Yes |
| Event | Integrated Circuit Metrology, Inspection, and Process Control IX - Santa Clara, CA, USA Duration: Feb 20 1995 → Feb 22 1995 |
Other
| Other | Integrated Circuit Metrology, Inspection, and Process Control IX |
|---|---|
| City | Santa Clara, CA, USA |
| Period | 2/20/95 → 2/22/95 |
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ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics
Cite this
Broadband UV small-spot spectroscopic ellipsometer. / Piwonka-Corle, Timothy R.; Kaack, Torsten R.; Scoffone, K. F.; Chen, Xing; Malwankar, K. B.; Keefer, Mark E.; LaComb, Lloyd J; Stehle, Jean Louis; Piel, Jean P.; Zahorski, Dorian; Thomas, O.; Rey, J. P.; Escadafals, L.
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2439 1995. p. 114-125.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Broadband UV small-spot spectroscopic ellipsometer
AU - Piwonka-Corle, Timothy R.
AU - Kaack, Torsten R.
AU - Scoffone, K. F.
AU - Chen, Xing
AU - Malwankar, K. B.
AU - Keefer, Mark E.
AU - LaComb, Lloyd J
AU - Stehle, Jean Louis
AU - Piel, Jean P.
AU - Zahorski, Dorian
AU - Thomas, O.
AU - Rey, J. P.
AU - Escadafals, L.
PY - 1995
Y1 - 1995
N2 - The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO 2 on silicon, and Si 3N 4 on silicon, and a multiple layer stack of SiO 2/poly- Si/SiO 2 on silicon.
AB - The design of the world's first production worthy broadband ultra-violet and visible small spot spectroscopic ellipsometer is described. The instrument, called the Prometrix UV-1250SE, was developed by the Prometrix division of Tencor Instruments in cooperation with SOPRA S.A., a pioneer in the field of spectroscopic ellipsometry. It has the ability to measure both the thickness and refractive index of different layers on a wide variety of materials in multiple layer film stacks. In this paper the optical system will be reviewed and spot size data presented. We will further discuss some of the design considerations such as the angle of incidence and allowed spread of the collection beam. Data characterizing the precision and stability of the instrument is presented for a variety of films including SiO 2 on silicon, and Si 3N 4 on silicon, and a multiple layer stack of SiO 2/poly- Si/SiO 2 on silicon.
UR - http://www.scopus.com/inward/record.url?scp=0029425380&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0029425380&partnerID=8YFLogxK
M3 - Conference contribution
SN - 0819417874
SN - 9780819417879
VL - 2439
SP - 114
EP - 125
BT - Proceedings of SPIE - The International Society for Optical Engineering
ER -