Characterization of metallic multilayers for X-ray optics

Charles M. Falco, J. M. Slaughter

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

X-ray reflectivity is a sensitive tool for characterizing interfaces in multilayers. Using an appropriate model, the low-angle θ-2θ spectra can be fit to yield the thickness and roughness of each layer. For Si/Mo, a model that includes an interlayer at the Mo on Si interface gives much better results than a simple bilayer model. Non-specular X-ray scattering measurements are particularly sensitive to roughness that is correlated from layer to layer because correlated roughness gives rise to reasonant scattering in particular non-specular directions. The non-specular behavior can be understood in terms of current theories of X-ray scattering from multilayers. Structural parameters, such as spatial frequencies of the correlated roughness and a coherence length for the correlations can be determined from these data. For the Si/Mo multilayers studied, spatial frequencies below 1/200 Å-1 are correlated throughout the multilayer.

Original languageEnglish (US)
Pages (from-to)3-7
Number of pages5
JournalJournal of Magnetism and Magnetic Materials
Volume126
Issue number1-3
DOIs
StatePublished - Sep 1993

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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