Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park, Justin Sierchio, Melissa Zaverton, Youngsik Kim, Tom D. Milster

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.

Original languageEnglish (US)
Article number023401
JournalOptical Engineering
Volume51
Issue number2
DOIs
StatePublished - Feb 1 2012
Externally publishedYes

Keywords

  • diffractive optic element
  • gray-scale lithography
  • laser direct writer
  • photoresist characterization
  • resist profile simulation

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

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