Characterization of photoresist and study on developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park, Youngsik Kim, Melissa Zaverton, Justin Sierchio, Tom D. Milster

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have characterized photoresist used for fabrication of gray-scale diffractive optic elements using Dill's and Mack's parameters. Using the fast-marching method, simulations of resist profiles have been shown to match experimental results.

Original languageEnglish (US)
Title of host publicationOptical Fabrication and Testing, OFT 2010
PublisherOptical Society of America (OSA)
ISBN (Print)9781557528933
DOIs
StatePublished - Jan 1 2010
EventOptical Fabrication and Testing, OFT 2010 - Jackson Hole, WY, United States
Duration: Jun 13 2010Jun 17 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherOptical Fabrication and Testing, OFT 2010
CountryUnited States
CityJackson Hole, WY
Period6/13/106/17/10

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Characterization of photoresist and study on developed resist profile for the fabrication of gray-scale diffractive optic elements'. Together they form a unique fingerprint.

  • Cite this

    Park, J. R., Kim, Y., Zaverton, M., Sierchio, J., & Milster, T. D. (2010). Characterization of photoresist and study on developed resist profile for the fabrication of gray-scale diffractive optic elements. In Optical Fabrication and Testing, OFT 2010 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/oft.2010.otuc4