Characterizing recycled fumed silica slurries in ILD CMP applications

Ara Philipossian, Farhang Shadman, Patrick Levy, Saied Tousi, Barry Gotlinsk, W. Scott Rader, Paul Lefevre, Isamu Koshiyama

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Characteristics of recycle fumed silica slurries in interlayer dielectric (ILD) chemical-mechanical polishing (CMP) applications were investigated. All polishing experiments were performed on 100-mm thermally grown SiO2 wafers using a scaled version of a 472 polisher. Recycled slurry decreases the CMP removal rate and reduces the coefficient of friction, effects that are only partially alleviated by slurry filtering. The results show that filtration can reduce defects during CMP processing and is used as means of removing agglomerated particles or foreign materials that may have been introduced into the slurry as a result of ILD polishing.

Original languageEnglish (US)
Pages (from-to)71-82
Number of pages12
JournalMICRO
Volume23
Issue number6
StatePublished - Jul 2005

Fingerprint

slurries
Chemical mechanical polishing
Slurries
polishing
Silicon Dioxide
interlayers
Silica
silicon dioxide
Polishing
Friction
Defects
coefficient of friction
Processing
wafers
Experiments
defects

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Materials Science(all)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Philipossian, A., Shadman, F., Levy, P., Tousi, S., Gotlinsk, B., Rader, W. S., ... Koshiyama, I. (2005). Characterizing recycled fumed silica slurries in ILD CMP applications. MICRO, 23(6), 71-82.

Characterizing recycled fumed silica slurries in ILD CMP applications. / Philipossian, Ara; Shadman, Farhang; Levy, Patrick; Tousi, Saied; Gotlinsk, Barry; Rader, W. Scott; Lefevre, Paul; Koshiyama, Isamu.

In: MICRO, Vol. 23, No. 6, 07.2005, p. 71-82.

Research output: Contribution to journalArticle

Philipossian, A, Shadman, F, Levy, P, Tousi, S, Gotlinsk, B, Rader, WS, Lefevre, P & Koshiyama, I 2005, 'Characterizing recycled fumed silica slurries in ILD CMP applications', MICRO, vol. 23, no. 6, pp. 71-82.
Philipossian A, Shadman F, Levy P, Tousi S, Gotlinsk B, Rader WS et al. Characterizing recycled fumed silica slurries in ILD CMP applications. MICRO. 2005 Jul;23(6):71-82.
Philipossian, Ara ; Shadman, Farhang ; Levy, Patrick ; Tousi, Saied ; Gotlinsk, Barry ; Rader, W. Scott ; Lefevre, Paul ; Koshiyama, Isamu. / Characterizing recycled fumed silica slurries in ILD CMP applications. In: MICRO. 2005 ; Vol. 23, No. 6. pp. 71-82.
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