Charged particles in process liquids

Iqbal Ali, Srini Raghavan, Subhash H. Risbud

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Many researchers believe that the presence of particulate impurities in process liquids is a major source of contamination in semiconductor manufacturing. We have found that organic and inorganic particulate impurities are charged in process liquids. The magnitude and sign of this charge is characteristic of the impurity particle-liquid combination. Fluoride ions adsorb strongly on oxide as well as polymer particles. In addition, exposure to uv light alters the surface chemistry of photoresist particles.

Original languageEnglish (US)
Pages (from-to)92-95
Number of pages4
JournalSemiconductor International
Volume13
Issue number5
StatePublished - Apr 1 1990

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Microbiology
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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