Many researchers believe that the presence of particulate impurities in process liquids is a major source of contamination in semiconductor manufacturing. We have found that organic and inorganic particulate impurities are charged in process liquids. The magnitude and sign of this charge is characteristic of the impurity particle-liquid combination. Fluoride ions adsorb strongly on oxide as well as polymer particles. In addition, exposure to uv light alters the surface chemistry of photoresist particles.
|Original language||English (US)|
|Number of pages||4|
|State||Published - Apr 1 1990|
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering