Charged particles in process liquids

Iqbal Ali, Srini Raghavan, Subhash H. Risbud

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Many researchers believe that the presence of particulate impurities in process liquids is a major source of contamination in semiconductor manufacturing. We have found that organic and inorganic particulate impurities are charged in process liquids. The magnitude and sign of this charge is characteristic of the impurity particle-liquid combination. Fluoride ions adsorb strongly on oxide as well as polymer particles. In addition, exposure to uv light alters the surface chemistry of photoresist particles.

Original languageEnglish (US)
Pages (from-to)92-95
Number of pages4
JournalSemiconductor International
Volume13
Issue number5
StatePublished - Apr 1990

Fingerprint

Semiconductors
Charged particles
Fluorides
Oxides
Polymers
charged particles
Research Personnel
Impurities
Ions
Light
impurities
particulates
Liquids
liquids
Photoresists
Surface chemistry
photoresists
fluorides
contamination
Contamination

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Charged particles in process liquids. / Ali, Iqbal; Raghavan, Srini; Risbud, Subhash H.

In: Semiconductor International, Vol. 13, No. 5, 04.1990, p. 92-95.

Research output: Contribution to journalArticle

Ali, I, Raghavan, S & Risbud, SH 1990, 'Charged particles in process liquids', Semiconductor International, vol. 13, no. 5, pp. 92-95.
Ali, Iqbal ; Raghavan, Srini ; Risbud, Subhash H. / Charged particles in process liquids. In: Semiconductor International. 1990 ; Vol. 13, No. 5. pp. 92-95.
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