Compact snapshot dual-mode interferometric system for on-machine measurement

Daodang Wang, Xiangyu Fu, Ping Xu, Xiaobo Tian, Oliver Spires, Jian Liang, Heng Wu, Rongguang Liang

Research output: Contribution to journalArticle

Abstract

To meet the need of on-machine metrology in optical manufacturing, a compact and snapshot dual-mode interferometric system is proposed for surface shape and roughness measurement. To simplify the measurement process between surface shape and roughness, a novel concept of using optical filters to separate the beam paths in the reference arm is introduced. A pixelated camera with a micro-polarizer array acquires four pi/2 phase-shifted interferograms simultaneously to minimize the environmental disturbance. Besides, the configuration-optimization-based subaperture stitching technique is introduced to extend the measurable aperture range. Both numerical analysis and experiments have been carried out to demonstrate the feasibility of the proposed compact snapshot dual-mode interferometer. The proposed system provides a powerful and portable tool to achieve on-machine surface characterization of various optical elements over a wide range of spatial frequencies and aperture sizes.

Original languageEnglish (US)
Article number106129
JournalOptics and Lasers in Engineering
Volume132
DOIs
StatePublished - Sep 2020

Keywords

  • Dual-mode interferometer
  • On-machine measurement
  • Optical interferometry
  • Subaperture stitching

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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