Comparison of inorganic and organic acid etching processes on germanium(100)

S. L. Heslop, A. J. Muscat

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ge(100) surfaces were cleaned in aqueous hydrochloric and citric acids. X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry were used to measure the surface composition and film thickness, respectively. Alkanethiolate self-assembled monolayers were formed after each acid treatment to assess oxide removal since sulfur only bonds with elemental Ge. XPS showed that sonication is required to remove citric acid species which remain on the surface after etching. The residual citric acid on the surface inhibits the liquid phase deposition of the alkanethiol layer likely by physically blocking surface sites. Aqueous hydrochloric acid etching removed more oxides from the surface, and the alkanethiol formed a dense monolayer.

Original languageEnglish (US)
Title of host publication16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019
EditorsKoichiro Saga, Paul W. Mertens, Takeshi Hattori, Jerzy Ruzyllo, Anthony J. Muscat
PublisherElectrochemical Society Inc.
Pages57-63
Number of pages7
Edition2
ISBN (Electronic)9781607685395
DOIs
StatePublished - Jan 1 2019
Event16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting - Atlanta, United States
Duration: Oct 13 2019Oct 17 2019

Publication series

NameECS Transactions
Number2
Volume92
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

Conference16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting
CountryUnited States
CityAtlanta
Period10/13/1910/17/19

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Heslop, S. L., & Muscat, A. J. (2019). Comparison of inorganic and organic acid etching processes on germanium(100). In K. Saga, P. W. Mertens, T. Hattori, J. Ruzyllo, & A. J. Muscat (Eds.), 16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 (2 ed., pp. 57-63). (ECS Transactions; Vol. 92, No. 2). Electrochemical Society Inc.. https://doi.org/10.1149/09202.0057ecst