Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method

Y. Zhuang, Y. Sampurno, C. Wu, B. Wu, Y. Mu, L. Borucki, Ara Philipossian, R. Yang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

In this study, slurry film distribution on an embossed Politex pad was compared between a novel slurry injection system (SIS) and conventional slurry application method. The slurry injector was placed on top of the pad surface and it injected slurry in a thin layer at the device trailing edge using multiple injection points. Slurry was also applied to the pad center area using the conventional slurry application method. A fluorescent dye (4-methyl- umbelliferone) was added to the slurry. The slurry fluoresced under UV light and the fluorescent light was captured by a high resolution charged coupled device camera. Results showed that SIS provided a much more uniform slurry distribution to the pad-wafer interface than the conventional slurry application method.

Original languageEnglish (US)
Title of host publicationECS Transactions
PublisherElectrochemical Society Inc.
Pages625-631
Number of pages7
Volume60
Edition1
DOIs
StatePublished - 2014

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Ultraviolet radiation
Dyes
Cameras

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Zhuang, Y., Sampurno, Y., Wu, C., Wu, B., Mu, Y., Borucki, L., ... Yang, R. (2014). Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method. In ECS Transactions (1 ed., Vol. 60, pp. 625-631). Electrochemical Society Inc.. https://doi.org/10.1149/06001.0625ecst

Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method. / Zhuang, Y.; Sampurno, Y.; Wu, C.; Wu, B.; Mu, Y.; Borucki, L.; Philipossian, Ara; Yang, R.

ECS Transactions. Vol. 60 1. ed. Electrochemical Society Inc., 2014. p. 625-631.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhuang, Y, Sampurno, Y, Wu, C, Wu, B, Mu, Y, Borucki, L, Philipossian, A & Yang, R 2014, Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method. in ECS Transactions. 1 edn, vol. 60, Electrochemical Society Inc., pp. 625-631. https://doi.org/10.1149/06001.0625ecst
Zhuang Y, Sampurno Y, Wu C, Wu B, Mu Y, Borucki L et al. Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method. In ECS Transactions. 1 ed. Vol. 60. Electrochemical Society Inc. 2014. p. 625-631 https://doi.org/10.1149/06001.0625ecst
Zhuang, Y. ; Sampurno, Y. ; Wu, C. ; Wu, B. ; Mu, Y. ; Borucki, L. ; Philipossian, Ara ; Yang, R. / Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method. ECS Transactions. Vol. 60 1. ed. Electrochemical Society Inc., 2014. pp. 625-631
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