Comparison of slurry film distribution between a novel slurry injection system and conventional slurry application method

Y. Zhuang, Y. Sampurno, C. Wu, B. Wu, Y. Mu, L. Borucki, A. Philipossian, R. Yang

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

In this study, slurry film distribution on an embossed Politex pad was compared between a novel slurry injection system (SIS) and conventional slurry application method. The slurry injector was placed on top of the pad surface and it injected slurry in a thin layer at the device trailing edge using multiple injection points. Slurry was also applied to the pad center area using the conventional slurry application method. A fluorescent dye (4-methyl- umbelliferone) was added to the slurry. The slurry fluoresced under UV light and the fluorescent light was captured by a high resolution charged coupled device camera. Results showed that SIS provided a much more uniform slurry distribution to the pad-wafer interface than the conventional slurry application method.

Original languageEnglish (US)
Pages (from-to)625-631
Number of pages7
JournalECS Transactions
Volume60
Issue number1
DOIs
StatePublished - 2014

ASJC Scopus subject areas

  • Engineering(all)

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