Control of effective cooling rate upon magnetron sputter deposition of glassy Ge15Te85

Julian Pries, Shuai Wei, Felix Hoff, Pierre Lucas, Matthias Wuttig

Research output: Contribution to journalArticle

Abstract

Reducing the enthalpy of as-deposited amorphous films is desirable as it improves their kinetic stability and enhances the reliability of resulting devices. Here we demonstrate that Ge15Te85 glass films of lower enthalpy are produced by increasing the voltage during magnetron sputter deposition. An increase of ~100 V leads to a drop in effective cooling rate of almost three orders of magnitude, thereby yielding markedly lower enthalpy glasses. The sputtering voltage therefore constitutes a novel parameter for tuning the fictive temperature of glass films, which could help to obtain ultra-stable glasses in combination with substrate temperature control.

Original languageEnglish (US)
Pages (from-to)223-226
Number of pages4
JournalScripta Materialia
Volume178
DOIs
Publication statusPublished - Mar 15 2020

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Keywords

  • Chalcogenide glasses
  • Fictive temperature
  • Glass transition
  • Metastable phases
  • Quenching
  • Undercooling

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

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