Control of polariton patterns in semiconductor microcavities

Y. C. Tse, P. Lewandowski, V. Ardizzone, N. H. Kwong, M. H. Luk, A. Lücke, M. Abbarchi, J. Bloch, E. Baudin, E. Galopin, A. Lemaitre, C. Y. Tsang, K. P. Chan, P. T. Leung, Ph Roussignol, R. Binder, J. Tignon, S. Schumacher

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Polaritons in semiconductor microcavities can form patterns analogous to conventional Turing patterns, including two-spot and hexagon far field patterns. We present theoretical concepts of pattern formation and control, together with experimental observations.

Original languageEnglish (US)
Title of host publicationFrontiers in Optics, FiO 2014
PublisherOptical Society of America (OSA)
ISBN (Electronic)1557522863
StatePublished - Oct 14 2014

Publication series

NameFrontiers in Optics, FiO 2014

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Tse, Y. C., Lewandowski, P., Ardizzone, V., Kwong, N. H., Luk, M. H., Lücke, A., Abbarchi, M., Bloch, J., Baudin, E., Galopin, E., Lemaitre, A., Tsang, C. Y., Chan, K. P., Leung, P. T., Roussignol, P., Binder, R., Tignon, J., & Schumacher, S. (2014). Control of polariton patterns in semiconductor microcavities. In Frontiers in Optics, FiO 2014 (Frontiers in Optics, FiO 2014). Optical Society of America (OSA).