Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning

Subramanian Tamilmani, Wayne Huang, Srini Raghavan, Robert Small

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The effectiveness of benzotriazole and certain hydroxamic acids in inhibiting the corrosion of copper in hydroxylamine-based chemical systems was studied. Benzotriazole and salicylhydroxamic acid were identified to be efficient inhibitors. A detailed study of the effect of inhibitor concentration on inhibition efficiency was performed using electrochemical methods.

Original languageEnglish (US)
Pages (from-to)271-274
Number of pages4
JournalSolid State Phenomena
Volume92
StatePublished - 2003

Fingerprint

Cytidine Monophosphate
Hydroxylamine
Corrosion inhibitors
inhibitors
cleaning
Copper
Cleaning
corrosion
chemistry
Hydroxamic Acids
copper
acids
Acids
Corrosion
benzotriazole
salicylhydroxamic acid

Keywords

  • Copper CMP
  • Corrosion inhibitors
  • Hydroxylamine

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning. / Tamilmani, Subramanian; Huang, Wayne; Raghavan, Srini; Small, Robert.

In: Solid State Phenomena, Vol. 92, 2003, p. 271-274.

Research output: Contribution to journalArticle

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