Corrosion inhibitors for copper in hydroxylamine-based chemistries used for CMP and post-CMP cleaning

Subramanian Tamilmani, Wayne Huang, Srini Raghavan, Robert Small

Research output: Contribution to journalConference article

4 Scopus citations

Abstract

The effectiveness of benzotriazole and certain hydroxamic acids in inhibiting the corrosion of copper in hydroxylamine-based chemical systems was studied. Benzotriazole and salicylhydroxamic acid were identified to be efficient inhibitors. A detailed study of the effect of inhibitor concentration on inhibition efficiency was performed using electrochemical methods.

Original languageEnglish (US)
Pages (from-to)271-274
Number of pages4
JournalSolid State Phenomena
Volume92
StatePublished - Jan 1 2003
EventThe International Symposium on Ultra Clean Processing of Silicon Surfaces V - Ostend, Belgium
Duration: Sep 16 2002Sep 18 2002

Keywords

  • Copper CMP
  • Corrosion inhibitors
  • Hydroxylamine

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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