Dependence of orientation and electrical properties in sputtered ZnO upon deposition conditions and substrate

M. D. Howell, S. Akamine, Lloyd J LaComb, B. Hadimioglu, T. R. Albrecht, B. T. Khuri-Yakub, L. C. Goddard, T. E. Carver

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The authors have studied how orientation of planar magnetron sputtered ZnO varies as a function of radius from the center of the sputter target. They show that orientation deviates from normal with increasing radius from center, even on substrates parallel to the sputter cathode. The ZnO was deposited upon C-axis normal sapphire (Al2O3), fused quartz, and 111-Si under varied conditions, including variations in temperature, gas flow rate, sputter power, radial position relative to target center, and substrate angle. Production of high-quality ZnO, as evidenced by the X-ray rocking curve, is demonstrated. The ZnO quality is correlated to composition by stoichiometric measurements. Changes in orientation angle, crystal quality, and deposition angle with increased radius are shown and compared with computer simulations of the extended source.

Original languageEnglish (US)
Title of host publicationUltrasonics Symposium Proceedings
PublisherPubl by IEEE
Pages677-680
Number of pages4
Volume2
StatePublished - 1988
Externally publishedYes
EventIEEE 1988 Ultrasonics Symposium - Proceedings - Chicago, IL, USA
Duration: Oct 2 1988Oct 5 1988

Other

OtherIEEE 1988 Ultrasonics Symposium - Proceedings
CityChicago, IL, USA
Period10/2/8810/5/88

Fingerprint

Electric properties
Substrates
Sapphire
Crystal orientation
Flow of gases
Quartz
Cathodes
Flow rate
X rays
Crystals
Computer simulation
Chemical analysis
Temperature

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Howell, M. D., Akamine, S., LaComb, L. J., Hadimioglu, B., Albrecht, T. R., Khuri-Yakub, B. T., ... Carver, T. E. (1988). Dependence of orientation and electrical properties in sputtered ZnO upon deposition conditions and substrate. In Ultrasonics Symposium Proceedings (Vol. 2, pp. 677-680). Publ by IEEE.

Dependence of orientation and electrical properties in sputtered ZnO upon deposition conditions and substrate. / Howell, M. D.; Akamine, S.; LaComb, Lloyd J; Hadimioglu, B.; Albrecht, T. R.; Khuri-Yakub, B. T.; Goddard, L. C.; Carver, T. E.

Ultrasonics Symposium Proceedings. Vol. 2 Publ by IEEE, 1988. p. 677-680.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Howell, MD, Akamine, S, LaComb, LJ, Hadimioglu, B, Albrecht, TR, Khuri-Yakub, BT, Goddard, LC & Carver, TE 1988, Dependence of orientation and electrical properties in sputtered ZnO upon deposition conditions and substrate. in Ultrasonics Symposium Proceedings. vol. 2, Publ by IEEE, pp. 677-680, IEEE 1988 Ultrasonics Symposium - Proceedings, Chicago, IL, USA, 10/2/88.
Howell MD, Akamine S, LaComb LJ, Hadimioglu B, Albrecht TR, Khuri-Yakub BT et al. Dependence of orientation and electrical properties in sputtered ZnO upon deposition conditions and substrate. In Ultrasonics Symposium Proceedings. Vol. 2. Publ by IEEE. 1988. p. 677-680
Howell, M. D. ; Akamine, S. ; LaComb, Lloyd J ; Hadimioglu, B. ; Albrecht, T. R. ; Khuri-Yakub, B. T. ; Goddard, L. C. ; Carver, T. E. / Dependence of orientation and electrical properties in sputtered ZnO upon deposition conditions and substrate. Ultrasonics Symposium Proceedings. Vol. 2 Publ by IEEE, 1988. pp. 677-680
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