Deposition of multiphase molybdate thin films by reactive sputtering

Joe Y. Zou, Glenn L Schrader

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Deposition parameters for reactive sputtering of thin films of MoO3 and NiMoO4 were examined with an emphasis of the effect of temperature, O2/Ar flow rate, pressure, and sputtering power (RF source) or voltage (DC source). Films of α- and β-MoO3 could be produced having oriented structures. α-NiMoO4 could only be formed as a multicrystalline film at higher temperatures. Multilayer films of NiMoO4 on α-MoO3 were found to include an interfacial material identified as β-NiMoO4. This metastable material was detected at relatively low temperatures in the bilayer structures.

Original languageEnglish (US)
Pages (from-to)52-62
Number of pages11
JournalThin Solid Films
Volume324
Issue number1-2
StatePublished - Jul 1 1998
Externally publishedYes

Fingerprint

molybdates
Reactive sputtering
sputtering
Thin films
thin films
Multilayer films
Temperature
Sputtering
flow velocity
direct current
Flow rate
Electric potential
electric potential
molybdenum trioxide
molybdate
temperature

Keywords

  • Deposition
  • Molybdate thin films
  • Reactive sputtering

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Deposition of multiphase molybdate thin films by reactive sputtering. / Zou, Joe Y.; Schrader, Glenn L.

In: Thin Solid Films, Vol. 324, No. 1-2, 01.07.1998, p. 52-62.

Research output: Contribution to journalArticle

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