Deposition of multiphase molybdate thin films by reactive sputtering

Joe Y. Zou, Glenn L. Schrader

Research output: Contribution to journalArticle

18 Scopus citations

Abstract

Deposition parameters for reactive sputtering of thin films of MoO3 and NiMoO4 were examined with an emphasis of the effect of temperature, O2/Ar flow rate, pressure, and sputtering power (RF source) or voltage (DC source). Films of α- and β-MoO3 could be produced having oriented structures. α-NiMoO4 could only be formed as a multicrystalline film at higher temperatures. Multilayer films of NiMoO4 on α-MoO3 were found to include an interfacial material identified as β-NiMoO4. This metastable material was detected at relatively low temperatures in the bilayer structures.

Original languageEnglish (US)
Pages (from-to)52-62
Number of pages11
JournalThin Solid Films
Volume324
Issue number1-2
DOIs
StatePublished - Jul 1 1998

Keywords

  • Deposition
  • Molybdate thin films
  • Reactive sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Deposition of multiphase molybdate thin films by reactive sputtering'. Together they form a unique fingerprint.

  • Cite this