Abstract
The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.
| Original language | English (US) |
|---|---|
| Title of host publication | Laser Institute of America, Proceedings |
| Publisher | Laser Inst of America |
| Volume | 83 |
| Edition | Pt 1 |
| State | Published - 1997 |
| Event | Proceedings of the 1997 Laser Materials Processing Conference, ICALEO'97. Part 1 (of 2) - San Diego, CA, USA Duration: Nov 17 1997 → Nov 20 1997 |
Other
| Other | Proceedings of the 1997 Laser Materials Processing Conference, ICALEO'97. Part 1 (of 2) |
|---|---|
| City | San Diego, CA, USA |
| Period | 11/17/97 → 11/20/97 |
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ASJC Scopus subject areas
- Physics and Astronomy(all)
Cite this
Diffusion controlled and convection dominated vaporization. / Chan, Cholik.
Laser Institute of America, Proceedings. Vol. 83 Pt 1. ed. Laser Inst of America, 1997.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Diffusion controlled and convection dominated vaporization
AU - Chan, Cholik
PY - 1997
Y1 - 1997
N2 - The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.
AB - The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.
UR - http://www.scopus.com/inward/record.url?scp=0031368195&partnerID=8YFLogxK
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M3 - Conference contribution
VL - 83
BT - Laser Institute of America, Proceedings
PB - Laser Inst of America
ER -