Diffusion controlled and convection dominated vaporization

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.

Original languageEnglish (US)
Title of host publicationLaser Institute of America, Proceedings
PublisherLaser Inst of America
Volume83
EditionPt 1
StatePublished - 1997
EventProceedings of the 1997 Laser Materials Processing Conference, ICALEO'97. Part 1 (of 2) - San Diego, CA, USA
Duration: Nov 17 1997Nov 20 1997

Other

OtherProceedings of the 1997 Laser Materials Processing Conference, ICALEO'97. Part 1 (of 2)
CitySan Diego, CA, USA
Period11/17/9711/20/97

Fingerprint

machining
convection
vapors
vaporizing
heat transfer
temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Chan, C. (1997). Diffusion controlled and convection dominated vaporization. In Laser Institute of America, Proceedings (Pt 1 ed., Vol. 83). Laser Inst of America.

Diffusion controlled and convection dominated vaporization. / Chan, Cholik.

Laser Institute of America, Proceedings. Vol. 83 Pt 1. ed. Laser Inst of America, 1997.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chan, C 1997, Diffusion controlled and convection dominated vaporization. in Laser Institute of America, Proceedings. Pt 1 edn, vol. 83, Laser Inst of America, Proceedings of the 1997 Laser Materials Processing Conference, ICALEO'97. Part 1 (of 2), San Diego, CA, USA, 11/17/97.
Chan C. Diffusion controlled and convection dominated vaporization. In Laser Institute of America, Proceedings. Pt 1 ed. Vol. 83. Laser Inst of America. 1997
Chan, Cholik. / Diffusion controlled and convection dominated vaporization. Laser Institute of America, Proceedings. Vol. 83 Pt 1. ed. Laser Inst of America, 1997.
@inproceedings{1f6547b8781a4a78b68d829e3321c6ee,
title = "Diffusion controlled and convection dominated vaporization",
abstract = "The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.",
author = "Cholik Chan",
year = "1997",
language = "English (US)",
volume = "83",
booktitle = "Laser Institute of America, Proceedings",
publisher = "Laser Inst of America",
edition = "Pt 1",

}

TY - GEN

T1 - Diffusion controlled and convection dominated vaporization

AU - Chan, Cholik

PY - 1997

Y1 - 1997

N2 - The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.

AB - The material removal by an intense power source is modeled. The vaporization rate is governed by the heat transfer within the substrate. Both convection dominated and diffusion controlled vapor removal are examined. Langmuir's model for vapor removal rate is also studied. The vaporizing temperatures and material removal rates subject to an intense power are obtained. It is found that the material removal rates are about the same regardless of the vapor removal models used. The diffusion controlled model, however, predicted a considerable higher vaporizing temperature. It is found that for most material removal process, the bulk flow motion driven by the pressure difference (convection dominated) is the predominant mechanism of vapor removal. Langmuir's model predicts the highest material removal but not much higher than that predicted by the convection dominated model.

UR - http://www.scopus.com/inward/record.url?scp=0031368195&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031368195&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0031368195

VL - 83

BT - Laser Institute of America, Proceedings

PB - Laser Inst of America

ER -