Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

J. David Musgraves, Barrett G Potter, Timothy J. Boyle

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

Original languageEnglish (US)
Pages (from-to)1306-1308
Number of pages3
JournalOptics Letters
Volume33
Issue number12
DOIs
StatePublished - Jun 15 2008
Externally publishedYes

Fingerprint

alkoxides
fluence
titanium
fabrication
slits
masks
Fresnel diffraction
metal oxides
near fields
diffraction patterns
illumination
aluminum
profiles
excitation

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution. / Musgraves, J. David; Potter, Barrett G; Boyle, Timothy J.

In: Optics Letters, Vol. 33, No. 12, 15.06.2008, p. 1306-1308.

Research output: Contribution to journalArticle

@article{741ea83f06a24ac7a9b8583ede4fd1f9,
title = "Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution",
abstract = "Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.",
author = "Musgraves, {J. David} and Potter, {Barrett G} and Boyle, {Timothy J.}",
year = "2008",
month = "6",
day = "15",
doi = "10.1364/OL.33.001306",
language = "English (US)",
volume = "33",
pages = "1306--1308",
journal = "Optics Letters",
issn = "0146-9592",
publisher = "The Optical Society",
number = "12",

}

TY - JOUR

T1 - Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

AU - Musgraves, J. David

AU - Potter, Barrett G

AU - Boyle, Timothy J.

PY - 2008/6/15

Y1 - 2008/6/15

N2 - Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

AB - Ultraviolet (λ=248nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 μm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm2, respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm2 was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.

UR - http://www.scopus.com/inward/record.url?scp=46149125530&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=46149125530&partnerID=8YFLogxK

U2 - 10.1364/OL.33.001306

DO - 10.1364/OL.33.001306

M3 - Article

C2 - 18552940

AN - SCOPUS:46149125530

VL - 33

SP - 1306

EP - 1308

JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 12

ER -