Dissolution characteristics of ceria in ascorbic acid solutions with implications to cleaning

S. Tamilmani, V. Lowalekar, S. Raghavan, R. Small

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The interaction of ascorbic acid with ceria as well as with hydrogen peroxide produces ascorbyl radicals by oxidation. Ascorbic acid solutions containing peroxide can provide a dissolution rate of 0.1 Å/min. Such solutions have potential to be used in post-CMP clean applications.

Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Silicon Surfaces VII, UCPSS 2004 - Proceedings of the 7th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS)
PublisherTrans Tech Publications Ltd
Pages283-286
Number of pages4
ISBN (Print)390845106X, 9783908451068
DOIs
StatePublished - Jan 1 2005
Event7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004 - Brussels, Belgium
Duration: Sep 20 2004Sep 22 2004

Publication series

NameSolid State Phenomena
Volume103-104
ISSN (Print)1012-0394

Other

Other7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004
CountryBelgium
CityBrussels
Period9/20/049/22/04

Keywords

  • Ascorbic acid
  • Ceria particles
  • Post CMP cleaning
  • STI CMP

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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  • Cite this

    Tamilmani, S., Lowalekar, V., Raghavan, S., & Small, R. (2005). Dissolution characteristics of ceria in ascorbic acid solutions with implications to cleaning. In Ultra Clean Processing of Silicon Surfaces VII, UCPSS 2004 - Proceedings of the 7th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS) (pp. 283-286). (Solid State Phenomena; Vol. 103-104). Trans Tech Publications Ltd. https://doi.org/10.4028/3-908451-06-x.283