Dual-mode snapshot interferometric system for on-machine metrology

Xiaobo Tian, Yu Zhang, Alexander Sohn, Oliver J. Spires, Rongguang Liang

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

For the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.

Original languageEnglish (US)
Article number044104
JournalOptical Engineering
Volume58
Issue number4
DOIs
StatePublished - Apr 1 2019

Keywords

  • Interference microscope
  • Interferometry
  • Roughness
  • Surface measurements

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

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