Effect of alignment and tolerances on reverse raytrace calibration

Kyle C. Heideman, John E Greivenkamp

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

There are several sources of error in interferometry to consider when testing surfaces in a non-null configuration. A model of the interferometer is typically used to calibrate these errors, but the model differs from the actual interferometer due to the alignment and tolerance of individual components. Reverse raytrace calibration using a model that differs from the real system corrects some errors but introduces others. Reverse optimization using measurements from known test configurations or configuration changes can produce a model that better reflects the real system. This paper addresses the tolerances required to obtain calibration precision from reverse ray tracing. The sources of error can be separated in a way that allows the amount of correction to be compared to the generated errors from misalignment. These errors can be expressed in a generic way that can be applied to any arbitrary interferometer architecture or test surface shape. The simulation results of a standard interferometer with standard tolerances shows that errors corrected by reverse ray tracing can be on the same order as the errors generated by reverse ray tracing an incorrect model. The efficacy of the calibration method resides in correction of other errors such as distortion and ray intercept coordinate error. These corrections aremuch larger than misalignment errors for surfaces with large departures. This method can be used to determine the level of interferometer component alignment required to accurately measure large departure surfaces with reverse ray tracing.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume9203
ISBN (Print)9781628412307
DOIs
StatePublished - 2014
EventInterferometry XVII: Techniques and Analysis - San Diego, United States
Duration: Aug 17 2014Aug 19 2014

Other

OtherInterferometry XVII: Techniques and Analysis
CountryUnited States
CitySan Diego
Period8/17/148/19/14

Fingerprint

Tolerance
Reverse
Alignment
Calibration
alignment
Interferometer
Interferometers
Ray Tracing
Ray tracing
ray tracing
interferometers
Misalignment
misalignment
Configuration
configurations
Surface testing
Model
Intercept
Error correction
Interferometry

Keywords

  • Aspheric
  • Interferometer Errors
  • Non-null
  • Retrace Error
  • Reverse Raytracing

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Heideman, K. C., & Greivenkamp, J. E. (2014). Effect of alignment and tolerances on reverse raytrace calibration. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 9203). [92030H-1] SPIE. https://doi.org/10.1117/12.2064453

Effect of alignment and tolerances on reverse raytrace calibration. / Heideman, Kyle C.; Greivenkamp, John E.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9203 SPIE, 2014. 92030H-1.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Heideman, KC & Greivenkamp, JE 2014, Effect of alignment and tolerances on reverse raytrace calibration. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 9203, 92030H-1, SPIE, Interferometry XVII: Techniques and Analysis, San Diego, United States, 8/17/14. https://doi.org/10.1117/12.2064453
Heideman KC, Greivenkamp JE. Effect of alignment and tolerances on reverse raytrace calibration. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9203. SPIE. 2014. 92030H-1 https://doi.org/10.1117/12.2064453
Heideman, Kyle C. ; Greivenkamp, John E. / Effect of alignment and tolerances on reverse raytrace calibration. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9203 SPIE, 2014.
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