Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

Michael Gehl, Ricky Gibson, Joshua Hendrickson, Andrew Homyk, Antti Säynätjoki, Tapani Alasaarela, Lasse Karvonen, Ari Tervonen, Seppo Honkanen, Sander Zandbergen, Benjamin C. Richards, J. D. Olitzky, Axel Scherer, Galina Khitrova, Hyatt M. Gibbs, Ju YoungKim, Yong Hee Lee

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 ± 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

Original languageEnglish (US)
JournalJournal of the Optical Society of America B: Optical Physics
Volume29
Issue number2
DOIs
StatePublished - Feb 1 2012

Fingerprint

atomic layer epitaxy
Q factors
cavities
silicon
tuning
fabrication
thin films
wavelengths

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Statistical and Nonlinear Physics

Cite this

Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities. / Gehl, Michael; Gibson, Ricky; Hendrickson, Joshua; Homyk, Andrew; Säynätjoki, Antti; Alasaarela, Tapani; Karvonen, Lasse; Tervonen, Ari; Honkanen, Seppo; Zandbergen, Sander; Richards, Benjamin C.; Olitzky, J. D.; Scherer, Axel; Khitrova, Galina; Gibbs, Hyatt M.; YoungKim, Ju; Lee, Yong Hee.

In: Journal of the Optical Society of America B: Optical Physics, Vol. 29, No. 2, 01.02.2012.

Research output: Contribution to journalArticle

Gehl, M, Gibson, R, Hendrickson, J, Homyk, A, Säynätjoki, A, Alasaarela, T, Karvonen, L, Tervonen, A, Honkanen, S, Zandbergen, S, Richards, BC, Olitzky, JD, Scherer, A, Khitrova, G, Gibbs, HM, YoungKim, J & Lee, YH 2012, 'Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities', Journal of the Optical Society of America B: Optical Physics, vol. 29, no. 2. https://doi.org/10.1364/JOSAB.29.000A55
Gehl, Michael ; Gibson, Ricky ; Hendrickson, Joshua ; Homyk, Andrew ; Säynätjoki, Antti ; Alasaarela, Tapani ; Karvonen, Lasse ; Tervonen, Ari ; Honkanen, Seppo ; Zandbergen, Sander ; Richards, Benjamin C. ; Olitzky, J. D. ; Scherer, Axel ; Khitrova, Galina ; Gibbs, Hyatt M. ; YoungKim, Ju ; Lee, Yong Hee. / Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities. In: Journal of the Optical Society of America B: Optical Physics. 2012 ; Vol. 29, No. 2.
@article{d1165e70cbfb4ae993a4bd46409212cb,
title = "Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities",
abstract = "In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 ± 31{\%} in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.",
author = "Michael Gehl and Ricky Gibson and Joshua Hendrickson and Andrew Homyk and Antti S{\"a}yn{\"a}tjoki and Tapani Alasaarela and Lasse Karvonen and Ari Tervonen and Seppo Honkanen and Sander Zandbergen and Richards, {Benjamin C.} and Olitzky, {J. D.} and Axel Scherer and Galina Khitrova and Gibbs, {Hyatt M.} and Ju YoungKim and Lee, {Yong Hee}",
year = "2012",
month = "2",
day = "1",
doi = "10.1364/JOSAB.29.000A55",
language = "English (US)",
volume = "29",
journal = "Journal of the Optical Society of America B: Optical Physics",
issn = "0740-3224",
publisher = "The Optical Society",
number = "2",

}

TY - JOUR

T1 - Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

AU - Gehl, Michael

AU - Gibson, Ricky

AU - Hendrickson, Joshua

AU - Homyk, Andrew

AU - Säynätjoki, Antti

AU - Alasaarela, Tapani

AU - Karvonen, Lasse

AU - Tervonen, Ari

AU - Honkanen, Seppo

AU - Zandbergen, Sander

AU - Richards, Benjamin C.

AU - Olitzky, J. D.

AU - Scherer, Axel

AU - Khitrova, Galina

AU - Gibbs, Hyatt M.

AU - YoungKim, Ju

AU - Lee, Yong Hee

PY - 2012/2/1

Y1 - 2012/2/1

N2 - In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 ± 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

AB - In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 ± 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

UR - http://www.scopus.com/inward/record.url?scp=84863115233&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84863115233&partnerID=8YFLogxK

U2 - 10.1364/JOSAB.29.000A55

DO - 10.1364/JOSAB.29.000A55

M3 - Article

AN - SCOPUS:84863115233

VL - 29

JO - Journal of the Optical Society of America B: Optical Physics

JF - Journal of the Optical Society of America B: Optical Physics

SN - 0740-3224

IS - 2

ER -