Effect of rapid thermal annealing on microstructural, magnetic, and microwave properties of FeGaB alloy films

Lubna R. Shah, X. Fan, X. Kou, Weigang Wang, Y. P. Zhang, J. Lou, N. X. Sun, J. Q. Xiao

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We have performed rapid thermal annealing (RTA) experiments on crystalline and amorphous [formula omitted] films in order to understand and reduce the linewidth of ferromagnetic resonance (FMR). In the absence of cubic anisotropy in amorphous films, the effective anisotropy is small, resulting in a narrow FMR linewidth. The FMR linewidth in both crystalline and amorphous films can be further reduced by RTA. In crystalline films, a minimum FMR linewidth can be achieved by annealing the samples at a relatively high temperature for a short time. The effect is attributed to the reduction in the uniaxial anisotropy. In amorphous films, the reduction in FMR linewidth is achieved at low temperature and short annealing time. Elevated temperatures and prolong time may crystallize the amorphous structure and introduce a much large cubic anisotropy, resulting in a large FMR linewidth.

Original languageEnglish (US)
Pages (from-to)31913
Number of pages1
JournalJournal of Applied Physics
Volume107
Issue number9
DOIs
StatePublished - May 1 2010
Externally publishedYes

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ferromagnetic resonance
magnetic properties
microwaves
annealing
anisotropy

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Effect of rapid thermal annealing on microstructural, magnetic, and microwave properties of FeGaB alloy films. / Shah, Lubna R.; Fan, X.; Kou, X.; Wang, Weigang; Zhang, Y. P.; Lou, J.; Sun, N. X.; Xiao, J. Q.

In: Journal of Applied Physics, Vol. 107, No. 9, 01.05.2010, p. 31913.

Research output: Contribution to journalArticle

Shah, Lubna R. ; Fan, X. ; Kou, X. ; Wang, Weigang ; Zhang, Y. P. ; Lou, J. ; Sun, N. X. ; Xiao, J. Q. / Effect of rapid thermal annealing on microstructural, magnetic, and microwave properties of FeGaB alloy films. In: Journal of Applied Physics. 2010 ; Vol. 107, No. 9. pp. 31913.
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AU - Lou, J.

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AU - Xiao, J. Q.

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