Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters

Juan Manuel Russo, Jose E. Castillo, Raymond K. Kostuk

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

Abstract

The good optical properties of PQ (phenanthrenequinone)-doped PMMA (poly methylmethacrylate) and its flexibility to fabricate different substrate configurations make this material attractive for holographic recording. In previous work, filters in PQ/PMMA for Wavelength Division Multiplexing (WDM) and Optical Code Division Multiple Access (OCDMA) were demonstrated and shown to have a 0.03nm/°C thermal tuning range operating near 1550nm. In this paper we investigate the effect of adding silicon dioxide nanoparticles to PQ/PMMA in order to measure the thermal tuning range and investigate the performance of these filters.

Original languageEnglish (US)
Title of host publicationLinear and Nonlinear Optics of Organic Materials VII
DOIs
StatePublished - Dec 1 2007
EventLinear and Nonlinear Optics of Organic Materials VII - San Diego, CA, United States
Duration: Aug 28 2007Aug 30 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6653
ISSN (Print)0277-786X

Other

OtherLinear and Nonlinear Optics of Organic Materials VII
CountryUnited States
CitySan Diego, CA
Period8/28/078/30/07

Keywords

  • Holography
  • Nanoparticles
  • PQ/PMMA
  • Silicon dioxide
  • Temperature
  • Tuning

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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