Effect of slurry application/injection methods and polishing conditions on bow wave characteristics

X. Liao, Y. Sampurno, Y. Zhuang, F. Sudargho, A. Rice, Ara Philipossian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this study, the effect of slurry application/injection methods and polishing conditions on slurry flow dynamics at the retaining ring bow wave was investigated. Two slurry application/injection methods (standard slurry application method and novel slurry injection method) were used. For each method, an ultraviolet enhanced fluorescence system was implemented to measure the slurry film thickness at bow wave for a polyetheretherketone (PEEK) retaining ring at different sliding velocities, slurry flow rates and ring pressures. Results indicated that the novel slurry injection method generated significantly thicker slurry film at the bow wave than that of the standard slurry application method. For both methods, slurry film thickness at the bow wave increased with increasing flow rate and ring pressure while it decreased with increasing sliding velocity.

Original languageEnglish (US)
Title of host publicationECS Transactions
Pages659-663
Number of pages5
Volume34
Edition1
DOIs
StatePublished - 2011
Event10th China Semiconductor Technology International Conference 2011, CSTIC 2011 - Shanghai, China
Duration: Mar 13 2011Mar 14 2011

Other

Other10th China Semiconductor Technology International Conference 2011, CSTIC 2011
CountryChina
CityShanghai
Period3/13/113/14/11

Fingerprint

Polishing
Film thickness
Flow rate
Fluorescence

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Liao, X., Sampurno, Y., Zhuang, Y., Sudargho, F., Rice, A., & Philipossian, A. (2011). Effect of slurry application/injection methods and polishing conditions on bow wave characteristics. In ECS Transactions (1 ed., Vol. 34, pp. 659-663) https://doi.org/10.1149/1.3567654

Effect of slurry application/injection methods and polishing conditions on bow wave characteristics. / Liao, X.; Sampurno, Y.; Zhuang, Y.; Sudargho, F.; Rice, A.; Philipossian, Ara.

ECS Transactions. Vol. 34 1. ed. 2011. p. 659-663.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Liao, X, Sampurno, Y, Zhuang, Y, Sudargho, F, Rice, A & Philipossian, A 2011, Effect of slurry application/injection methods and polishing conditions on bow wave characteristics. in ECS Transactions. 1 edn, vol. 34, pp. 659-663, 10th China Semiconductor Technology International Conference 2011, CSTIC 2011, Shanghai, China, 3/13/11. https://doi.org/10.1149/1.3567654
Liao X, Sampurno Y, Zhuang Y, Sudargho F, Rice A, Philipossian A. Effect of slurry application/injection methods and polishing conditions on bow wave characteristics. In ECS Transactions. 1 ed. Vol. 34. 2011. p. 659-663 https://doi.org/10.1149/1.3567654
Liao, X. ; Sampurno, Y. ; Zhuang, Y. ; Sudargho, F. ; Rice, A. ; Philipossian, Ara. / Effect of slurry application/injection methods and polishing conditions on bow wave characteristics. ECS Transactions. Vol. 34 1. ed. 2011. pp. 659-663
@inproceedings{a423019653fd4271a4b7a4c0edbbd479,
title = "Effect of slurry application/injection methods and polishing conditions on bow wave characteristics",
abstract = "In this study, the effect of slurry application/injection methods and polishing conditions on slurry flow dynamics at the retaining ring bow wave was investigated. Two slurry application/injection methods (standard slurry application method and novel slurry injection method) were used. For each method, an ultraviolet enhanced fluorescence system was implemented to measure the slurry film thickness at bow wave for a polyetheretherketone (PEEK) retaining ring at different sliding velocities, slurry flow rates and ring pressures. Results indicated that the novel slurry injection method generated significantly thicker slurry film at the bow wave than that of the standard slurry application method. For both methods, slurry film thickness at the bow wave increased with increasing flow rate and ring pressure while it decreased with increasing sliding velocity.",
author = "X. Liao and Y. Sampurno and Y. Zhuang and F. Sudargho and A. Rice and Ara Philipossian",
year = "2011",
doi = "10.1149/1.3567654",
language = "English (US)",
isbn = "9781607682356",
volume = "34",
pages = "659--663",
booktitle = "ECS Transactions",
edition = "1",

}

TY - GEN

T1 - Effect of slurry application/injection methods and polishing conditions on bow wave characteristics

AU - Liao, X.

AU - Sampurno, Y.

AU - Zhuang, Y.

AU - Sudargho, F.

AU - Rice, A.

AU - Philipossian, Ara

PY - 2011

Y1 - 2011

N2 - In this study, the effect of slurry application/injection methods and polishing conditions on slurry flow dynamics at the retaining ring bow wave was investigated. Two slurry application/injection methods (standard slurry application method and novel slurry injection method) were used. For each method, an ultraviolet enhanced fluorescence system was implemented to measure the slurry film thickness at bow wave for a polyetheretherketone (PEEK) retaining ring at different sliding velocities, slurry flow rates and ring pressures. Results indicated that the novel slurry injection method generated significantly thicker slurry film at the bow wave than that of the standard slurry application method. For both methods, slurry film thickness at the bow wave increased with increasing flow rate and ring pressure while it decreased with increasing sliding velocity.

AB - In this study, the effect of slurry application/injection methods and polishing conditions on slurry flow dynamics at the retaining ring bow wave was investigated. Two slurry application/injection methods (standard slurry application method and novel slurry injection method) were used. For each method, an ultraviolet enhanced fluorescence system was implemented to measure the slurry film thickness at bow wave for a polyetheretherketone (PEEK) retaining ring at different sliding velocities, slurry flow rates and ring pressures. Results indicated that the novel slurry injection method generated significantly thicker slurry film at the bow wave than that of the standard slurry application method. For both methods, slurry film thickness at the bow wave increased with increasing flow rate and ring pressure while it decreased with increasing sliding velocity.

UR - http://www.scopus.com/inward/record.url?scp=79959656907&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79959656907&partnerID=8YFLogxK

U2 - 10.1149/1.3567654

DO - 10.1149/1.3567654

M3 - Conference contribution

AN - SCOPUS:79959656907

SN - 9781607682356

VL - 34

SP - 659

EP - 663

BT - ECS Transactions

ER -