Effect of slurry application/injection methods and polishing conditions on bow wave characteristics

X. Liao, Y. Sampurno, Y. Zhuang, F. Sudargho, A. Rice, A. Philipossian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this study, the effect of slurry application/injection methods and polishing conditions on slurry flow dynamics at the retaining ring bow wave was investigated. Two slurry application/injection methods (standard slurry application method and novel slurry injection method) were used. For each method, an ultraviolet enhanced fluorescence system was implemented to measure the slurry film thickness at bow wave for a polyetheretherketone (PEEK) retaining ring at different sliding velocities, slurry flow rates and ring pressures. Results indicated that the novel slurry injection method generated significantly thicker slurry film at the bow wave than that of the standard slurry application method. For both methods, slurry film thickness at the bow wave increased with increasing flow rate and ring pressure while it decreased with increasing sliding velocity.

Original languageEnglish (US)
Title of host publicationChina Semiconductor Technology International Conference 2011, CSTIC 2011
Pages659-663
Number of pages5
Edition1
DOIs
StatePublished - Jul 1 2011
Event10th China Semiconductor Technology International Conference 2011, CSTIC 2011 - Shanghai, China
Duration: Mar 13 2011Mar 14 2011

Publication series

NameECS Transactions
Number1
Volume34
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other10th China Semiconductor Technology International Conference 2011, CSTIC 2011
CountryChina
CityShanghai
Period3/13/113/14/11

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Liao, X., Sampurno, Y., Zhuang, Y., Sudargho, F., Rice, A., & Philipossian, A. (2011). Effect of slurry application/injection methods and polishing conditions on bow wave characteristics. In China Semiconductor Technology International Conference 2011, CSTIC 2011 (1 ed., pp. 659-663). (ECS Transactions; Vol. 34, No. 1). https://doi.org/10.1149/1.3567654