Effect of slurry application/injection schemes on slurry availability during chemical mechanical planarization (CMP)

Xiaoyan Liao, Yasa Sampurno, Yun Zhuang, Ara Philipossian

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Effect of slurry applicationinjection schemes on slurry availability during CMP was investigated. A new ultraviolet enhanced fluorescence system was developed to measure slurry film thickness at the retaining ring bow wave for standard pad center area application and novel slurry injection methods. As the novel slurry injection system was placed adjacent to the retaining ring on the pad surface, it generated statistically thicker bow waves (up to 104 percent) in 7 out of 8 cases at different sliding velocities, slurry flow rates and ring pressures, providing more slurry availability for the pad-retaining ring interface. Slurry savings associated with the novel slurry injection system was estimated to range between 8 and 48 percent depending on specific process conditions.

Original languageEnglish (US)
JournalElectrochemical and Solid-State Letters
Volume15
Issue number4
DOIs
StatePublished - 2012

Fingerprint

Chemical mechanical polishing
availability
bow waves
retaining
Availability
injection
rings
Film thickness
Fluorescence
Flow rate
sliding
film thickness
flow velocity
fluorescence

ASJC Scopus subject areas

  • Electrochemistry
  • Electrical and Electronic Engineering
  • Materials Science(all)
  • Chemical Engineering(all)
  • Physical and Theoretical Chemistry

Cite this

Effect of slurry application/injection schemes on slurry availability during chemical mechanical planarization (CMP). / Liao, Xiaoyan; Sampurno, Yasa; Zhuang, Yun; Philipossian, Ara.

In: Electrochemical and Solid-State Letters, Vol. 15, No. 4, 2012.

Research output: Contribution to journalArticle

@article{0407c348a47b4975bbde8f80e8d6496d,
title = "Effect of slurry application/injection schemes on slurry availability during chemical mechanical planarization (CMP)",
abstract = "Effect of slurry applicationinjection schemes on slurry availability during CMP was investigated. A new ultraviolet enhanced fluorescence system was developed to measure slurry film thickness at the retaining ring bow wave for standard pad center area application and novel slurry injection methods. As the novel slurry injection system was placed adjacent to the retaining ring on the pad surface, it generated statistically thicker bow waves (up to 104 percent) in 7 out of 8 cases at different sliding velocities, slurry flow rates and ring pressures, providing more slurry availability for the pad-retaining ring interface. Slurry savings associated with the novel slurry injection system was estimated to range between 8 and 48 percent depending on specific process conditions.",
author = "Xiaoyan Liao and Yasa Sampurno and Yun Zhuang and Ara Philipossian",
year = "2012",
doi = "10.1149/2.009205esl",
language = "English (US)",
volume = "15",
journal = "Electrochemical and Solid-State Letters",
issn = "1099-0062",
publisher = "Electrochemical Society, Inc.",
number = "4",

}

TY - JOUR

T1 - Effect of slurry application/injection schemes on slurry availability during chemical mechanical planarization (CMP)

AU - Liao, Xiaoyan

AU - Sampurno, Yasa

AU - Zhuang, Yun

AU - Philipossian, Ara

PY - 2012

Y1 - 2012

N2 - Effect of slurry applicationinjection schemes on slurry availability during CMP was investigated. A new ultraviolet enhanced fluorescence system was developed to measure slurry film thickness at the retaining ring bow wave for standard pad center area application and novel slurry injection methods. As the novel slurry injection system was placed adjacent to the retaining ring on the pad surface, it generated statistically thicker bow waves (up to 104 percent) in 7 out of 8 cases at different sliding velocities, slurry flow rates and ring pressures, providing more slurry availability for the pad-retaining ring interface. Slurry savings associated with the novel slurry injection system was estimated to range between 8 and 48 percent depending on specific process conditions.

AB - Effect of slurry applicationinjection schemes on slurry availability during CMP was investigated. A new ultraviolet enhanced fluorescence system was developed to measure slurry film thickness at the retaining ring bow wave for standard pad center area application and novel slurry injection methods. As the novel slurry injection system was placed adjacent to the retaining ring on the pad surface, it generated statistically thicker bow waves (up to 104 percent) in 7 out of 8 cases at different sliding velocities, slurry flow rates and ring pressures, providing more slurry availability for the pad-retaining ring interface. Slurry savings associated with the novel slurry injection system was estimated to range between 8 and 48 percent depending on specific process conditions.

UR - http://www.scopus.com/inward/record.url?scp=84857253626&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84857253626&partnerID=8YFLogxK

U2 - 10.1149/2.009205esl

DO - 10.1149/2.009205esl

M3 - Article

AN - SCOPUS:84857253626

VL - 15

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

SN - 1099-0062

IS - 4

ER -