Effect of slurry flow rate on tribological, thermal, and removal rate attributes of copper CMP

Z. Li, L. Borucki, I. Koshiyama, Ara Philipossian

Research output: Contribution to journalArticle

51 Citations (Scopus)

Abstract

Chemical mechanical polishing of copper is examined experimentally and theoretically as a function of slurry flow rate and the product of applied wafer pressure and relative sliding speed (p × V). It is observed that under constant tribological conditions, the removal rate at any fixed value of p × V generally decreases as slurry flow rate increases. The increased cooling of the wafer surface, as a result of increased slurry flow rate, is used to explain this reduction in the reaction rate. At a fixed flow rate, it is further observed that removal rate does not necessarily increase monotonically with p × V. The rate instead depends on the particular values of pressure and velocity, regardless of the fact that they may result in the same value of p × V. This dependence is shown to be caused by changes in the coefficient for convective heat-transfer between the wafer and the slurry, as well as the heat partition factor, which determines the fraction of the total frictional power that heats the wafer. Results further indicate that trends in copper removal rate can be adequately explained with a Langmuir-Hinshelwood kinetics model with both mechanical and chemical rate components.

Original languageEnglish (US)
JournalJournal of the Electrochemical Society
Volume151
Issue number7
DOIs
StatePublished - 2004

Fingerprint

Cytidine Monophosphate
Copper
flow velocity
Flow rate
copper
wafers
Chemical mechanical polishing
heat
Reaction rates
convective heat transfer
polishing
sliding
Heat transfer
partitions
Cooling
reaction kinetics
Kinetics
Hot Temperature
trends
cooling

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Effect of slurry flow rate on tribological, thermal, and removal rate attributes of copper CMP. / Li, Z.; Borucki, L.; Koshiyama, I.; Philipossian, Ara.

In: Journal of the Electrochemical Society, Vol. 151, No. 7, 2004.

Research output: Contribution to journalArticle

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