Effect of surface charge and fluid properties on particle removal characteristics of a surface-optimized REB filter

Wayne P. Kelly, Donald C. Grant, Joseph Zahka, Wayne Huang, Srini Raghavan

Research output: Contribution to journalConference article

3 Scopus citations

Abstract

The surface properties of a filter were chosen to have complete retention of both PSL and silicon nitride particles in a wide pH range of HF. Particles were removed by non-sieving mechanisms, allowing the filter to have large pores resulting in high flow rate.

Original languageEnglish (US)
Pages (from-to)271-274
Number of pages4
JournalDiffusion and Defect Data Pt.B: Solid State Phenomena
Volume76-77
StatePublished - Dec 1 2000
Event5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium
Duration: Sep 18 2000Sep 20 2000

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics
  • Physics and Astronomy (miscellaneous)

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