Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops

Robert A. Governal, Alison Bonner, Farhang Shadman

Research output: Contribution to journalArticle

Abstract

Ultra-pure water systems in semiconductor plants consist of many components. Although the operating principles behind each component are well-known, the interactions between system components, including cancellation and synergism, are not generally understood and taken into account. In this study, two examples of these interactions are studied and analyzed: UV interactions with membrane filters and UV interactions with ion exchange units. The results indicate that the sequencing of UV and filter affect the total oxidizable carbon removal efficiency and it is preferable to have filter before UV. UV followed by ion exchange is an effective configuration for some impurities but can be undesirable for some contaminants and particles.

Original languageEnglish (US)
Pages (from-to)70-73
Number of pages4
JournalIEEE Transactions on Semiconductor Manufacturing
Volume5
Issue number1
DOIs
StatePublished - Feb 1992

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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