Effect of temperature on the interaction of silicon with nonionic surfactants in alkaline solutions

Joong S. Jeon, Srini Raghavan, Juan P. Carrejo

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

The interaction of silicon wafers with alkaline solutions of octylphenol polyethylene oxide nonionic surfactants of different ethylene oxide chain length has been characterized at 25, 50, and 75°C. Wettability of silicon wafers was improved significantly at higher temperatures. Surfactants with long ethylene oxide chains exhibited less adsorption than surfactants with short ethylene oxide chains, and increase in solution temperature resulted in increased adsorption. Generally, the addition of surfactants to alkaline solution decreased the surface roughness of silicon; however, the degree of reduction of surface roughness was influenced by the length of ethylene oxide chain and conditioning temperature.

Original languageEnglish (US)
Pages (from-to)277-283
Number of pages7
JournalJournal of the Electrochemical Society
Volume143
Issue number1
StatePublished - Jan 1996

Fingerprint

Ethylene Oxide
Nonionic surfactants
Silicon
ethylene oxide
Ethylene
surfactants
Surface-Active Agents
Surface active agents
Oxides
silicon
Silicon wafers
surface roughness
Surface roughness
interactions
wafers
Adsorption
Temperature
adsorption
temperature
conditioning

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Effect of temperature on the interaction of silicon with nonionic surfactants in alkaline solutions. / Jeon, Joong S.; Raghavan, Srini; Carrejo, Juan P.

In: Journal of the Electrochemical Society, Vol. 143, No. 1, 01.1996, p. 277-283.

Research output: Contribution to journalArticle

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