Effect of temperature on the interaction of silicon with nonionic surfactants in alkaline solutions

Joong S. Jeon, Srini Raghavan, Juan P. Carrejo

Research output: Contribution to journalArticle

23 Scopus citations

Abstract

The interaction of silicon wafers with alkaline solutions of octylphenol polyethylene oxide nonionic surfactants of different ethylene oxide chain length has been characterized at 25, 50, and 75°C. Wettability of silicon wafers was improved significantly at higher temperatures. Surfactants with long ethylene oxide chains exhibited less adsorption than surfactants with short ethylene oxide chains, and increase in solution temperature resulted in increased adsorption. Generally, the addition of surfactants to alkaline solution decreased the surface roughness of silicon; however, the degree of reduction of surface roughness was influenced by the length of ethylene oxide chain and conditioning temperature.

Original languageEnglish (US)
Pages (from-to)277-283
Number of pages7
JournalJournal of the Electrochemical Society
Volume143
Issue number1
DOIs
StatePublished - Jan 1996

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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