Effects of Stress Induced by the Underlying Layers on the Micro-Structures and Characteristic Phase Transformation Temperatures of Sputtered TiNi Thin Films

Rong Xin Wang, Yitshak Zohar, Man Wong

Research output: Contribution to conferencePaper

Abstract

The micro-structures and the phase transformation temperatures of sputtered titanium-nickel (TiNi) thin films, both free-standing and attached on different underlying multilayer substrates have been studied. Differences in the micro-structures, such as the lattice constants and the relative concentrations of TiNi, Ti2Ni and TiNi3 phases, were observed (1) among the free-standing and the attached films, (2) among the films attached on different underlying multi-layers and (3) among films with different relative orders of aging and release. Not surprisingly, the corresponding phase transformation temperatures are also different. It is proposed that both substrate- and process-induced stress significantly affect the micro-structures, hence the phase transformation characteristics, of the resulting shape-memory alloy thin films.

Original languageEnglish (US)
Pages2951-2955
Number of pages5
StatePublished - Dec 1 2001
Externally publishedYes
Event2001 ASME International Mechanical Engineering Congress and Exposition - New York, NY, United States
Duration: Nov 11 2001Nov 16 2001

Other

Other2001 ASME International Mechanical Engineering Congress and Exposition
CountryUnited States
CityNew York, NY
Period11/11/0111/16/01

ASJC Scopus subject areas

  • Engineering(all)

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    Wang, R. X., Zohar, Y., & Wong, M. (2001). Effects of Stress Induced by the Underlying Layers on the Micro-Structures and Characteristic Phase Transformation Temperatures of Sputtered TiNi Thin Films. 2951-2955. Paper presented at 2001 ASME International Mechanical Engineering Congress and Exposition, New York, NY, United States.