ELECTROCHEMICAL AND SURFACE CHARACTERISTICS OF TIN OXIDE AND INDIUM OXIDE ELECTRODES.

Neal R Armstrong, Albert W C Lin, Masamichi Fujihira, Theodore Kuwana

Research output: Contribution to journalArticle

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Abstract

The electrochemical characteristics of heavily doped tin oxide and indium oxide thin film electrodes have been correlated with results of surface analyses by x-ray photoelectron (ESCA) and Auger spectroscopy. From measurement of current, capacitance, and surface conductance as a function of the applied electrode potential, regions of potential where surface reactions were possibly occurring could be delineated. ESCA/Auger analyses of these electrodes, which were poised in various potential regions, confirmed the changes in the stoichiometry of the metal oxides at the surface. Similar analyses were performed on tin oxide surfaces which had been modified by derivatization of the surface. Such modifications resulted in the lowering of the effective carrier density of the surface.

Original languageEnglish (US)
Pages (from-to)741-750
Number of pages10
JournalAnalytical Chemistry
Volume48
Issue number4
StatePublished - Apr 1976
Externally publishedYes

Fingerprint

Tin oxides
Electrodes
Surface reactions
Photoelectrons
Stoichiometry
Oxides
Oxide films
Carrier concentration
indium oxide
Capacitance
Metals
Spectroscopy
X rays
Thin films

ASJC Scopus subject areas

  • Analytical Chemistry

Cite this

ELECTROCHEMICAL AND SURFACE CHARACTERISTICS OF TIN OXIDE AND INDIUM OXIDE ELECTRODES. / Armstrong, Neal R; Lin, Albert W C; Fujihira, Masamichi; Kuwana, Theodore.

In: Analytical Chemistry, Vol. 48, No. 4, 04.1976, p. 741-750.

Research output: Contribution to journalArticle

Armstrong, Neal R ; Lin, Albert W C ; Fujihira, Masamichi ; Kuwana, Theodore. / ELECTROCHEMICAL AND SURFACE CHARACTERISTICS OF TIN OXIDE AND INDIUM OXIDE ELECTRODES. In: Analytical Chemistry. 1976 ; Vol. 48, No. 4. pp. 741-750.
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